Plasma polymerization under DC glow. Estimation of formation of polymerized films using AFM technique.

被引：0

作者：

Sato, D ^{[1
]}

Suwa, T ^{[1
]}

Kakimoto, M ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,DEPT ORGAN & POLYMER MAT,MEGURO KU,TOKYO 152,JAPAN

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 213卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：394 / POLY

页数：1

共 30 条

[1] NOVEL PLASMA-POLYMERIZED FILMS UNDER DC GLOW-DISCHARGE
KAKIMOTO, MA
SUWA, T
IMAI, Y
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 249 - PMSE
[2] DC conduction mechanism in plasma polymerized vinylene carbonate thin films prepared by glow discharge technique
Sunirmal Majumder
A. H. Bhuiyan
Polymer Science Series A, 2011, 53 : 85 - 91
[3] DC Conduction Mechanism in Plasma Polymerized Vinylene Carbonate Thin Films Prepared by Glow Discharge Technique
Majumder, Sunirmal
Bhuiyan, A. H.
POLYMER SCIENCE SERIES A, 2011, 53 (01) : 85 - 91
[4] Novel plasma polymerized films under direct current glow discharge
Kakimoto, M.
Suwa, T.
Imai, Y.
Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering, 1995, 72
[5] Plasma polymerization in direct current glow: Characterization of plasma-polymerized films of benzene and fluorinated derivatives
Suwa, T
Jikei, M
Kakimoto, M
Imai, Y
MICROELECTRONICS TECHNOLOGY: POLYMERS FOR ADVANCED IMAGING AND PACKAGING, 1995, 614 : 471 - 484
[6] Novel plasma polymerization system using a dc glow discharge
Suwa, T
Jikei, M
Kakimoto, M
Imai, Y
Tanaka, A
Yoneda, K
THIN SOLID FILMS, 1996, 273 (1-2) : 258 - 262
[7] Research on etching of diamond films using DC glow oxygen plasma
Key Lab. of Plasma Chemistry and Advanced Materials in Hubei Province, Wuhan Institute of Chemical Technology, Wuhan 430073, China
Jingangshi yu Moliao Moju Gongcheng, 2007, 1 (35-38+43):
[8] EVALUATING THE ADHESION CHARACTERISTICS OF GLOW-DISCHARGE PLASMA-POLYMERIZED FILMS BY A NOVEL VOLTAGE CYCLING TECHNIQUE
NICHOLS, MF
HAHN, AW
JAMES, WJ
SHARMA, AK
YASUDA, HK
APPLIED POLYMER SYMPOSIA, 1984, (38) : 21 - 33
[9] FUNCTION OF SUBSTRATE BIAS POTENTIAL FOR FORMATION OF CUBIC BORON NITRIDE FILMS IN PLASMA CVD TECHNIQUE.
Chayahara, Akiyoshi
Yokoyama, Haruki
Imura, Takeshi
Osaka, Yukio
Japanese Journal of Applied Physics, Part 2: Letters, 1987, 26 (09): : 1435 - 1436
[10] Influence of DC biasing on the formation of hydrogenated amorphous carbon films using a plasma-based ion implantation technique
Watanabe, T. (watanabe-t@aist.go.jp), 1600, Japan Society of Applied Physics (41):

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