Advanced oxidation of a commercially important nonionic surfactant: Investigation of degradation products and toxicity

被引：49
作者：
Karci, Akin [1 ]
Arslan-Alaton, Idil [2 ]
Bekbolet, Miray [1 ]
机构：
[1] Bogazici Univ, Inst Environm Sci, TR-34342 Istanbul, Turkey
[2] Istanbul Tech Univ, Fac Civil Engn, Dept Environm Engn, TR-34469 Istanbul, Turkey
来源：
JOURNAL OF HAZARDOUS MATERIALS | 2013年 / 263卷
关键词：
Acute toxicity; Degradation product; H2O2/UV-C process; Nonylphenol decaethoxylate (NP-10); Photo-Fenton process; WASTE-WATER; ALKYLPHENOL ETHOXYLATES; PHOTOCATALYTIC DEGRADATION; NONYLPHENOL ETHOXYLATE; VIBRIO-FISCHERI; REMOVAL; OZONATION; BEHAVIOR; FENTON; FATE;
D O I：
10.1016/j.jhazmat.2013.03.052
中图分类号：
X [环境科学、安全科学];
学科分类号：
08 ; 0830 ;
摘要：
The evolution of degradation products and changes in acute toxicity during advanced oxidation of the nonionic surfactant nonylphenol decaethoxylate (NP-10) with the H2O2/UV-C and photo-Fenton processes were investigated. (HO2)-O-2/UV-C and photo-Fenton processes ensured complete removal of NP-10, which was accompanied by the generation of polyethylene glycols with 3-8 ethoxy units. Formation of aldehydes and low carbon carboxylic acids was evidenced. According to the acute toxicity tests carried out with Vibrio fischeri, degradation products being more inhibitory than the original NP-10 solution were formed after the H2O2/UV-C process, whereas the photo-Fenton process appeared to be toxicologically safer since acute toxicity did not increase relative to the original NP-10 solution after treatment. Temporal evolution of the acute toxicity was strongly correlated with the identified carboxylic acids being formed during the application of H2O2/UV-C and photo-Fenton processes. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：275 / 282
页数：8
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