On-Wafer Crystallization of Ultralow-κ Pure Silica Zeolite Films

被引：31

作者：

Liu, Yan ^{[2
]}

Lew, Christopher M. ^{[2
]}

Sun, Minwei ^{[2
]}

Cai, Rui ^{[2
]}

Wang, Junlan ^{[1
]}

Kloster, Grant ^{[3
]}

Boyanov, Boyan ^{[3
]}

Yan, Yushan ^{[2
]}

机构：

[1] Univ Washington, Dept Mech Engn, Seattle, WA 98195 USA

[2] Univ Calif Riverside, Dept Chem & Environm Engn, Riverside, CA 92521 USA

[3] Intel Corp, Hillsboro, OR 97124 USA

来源：

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2009年 / 48卷 / 26期

基金：

美国国家科学基金会;

关键词：

inorganic thin films; on-wafer crystallization; silica; structure-property relationships; zeolites; LOW-K DIELECTRICS; NANOPARTICLE SUSPENSIONS; THIN-FILMS; SPIN-ON; CONSTANT MATERIALS; MFI; FUNCTIONALIZATION; SPECTROSCOPY; EVAPORATION;

D O I：

10.1002/anie.200900461

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A higher goal: An on-wafer crystallization process to prepare pure silica zeolite (PSZ) MEL-type films that is superior to the previously used hydrothermal process is reported. These striation-free MEL-type films (right, see picture) outperform the traditional spin-on films (left) in terms of the κ value, mechanical properties, surface roughness, mesopore size, and size distribution. © 2009 Wiley-VCH Verlag GmbH & Co. KGaA.

引用

页码：4777 / 4780

页数：4

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