Design and performance of an X-ray undulator beamline PF-AR-NW2

被引：11

作者：

Mori, T ^{[1
]}

Nomura, A ^{[1
]}

Sato, A ^{[1
]}

Adachi, H ^{[1
]}

Uchida, Y ^{[1
]}

Toyoshima, A ^{[1
]}

Yamamoto, S ^{[1
]}

Tsuchiya, K ^{[1
]}

Shioya, T ^{[1
]}

Kawata, H ^{[1
]}

机构：

[1] High Energy Accelerator Res Org, Inst Mat Struct Sci, Photon Factory, Tsukuba, Ibaraki 3050801, Japan

来源：

SYNCHROTRON RADIATION INSTRUMENTATION | 2004年 / 705卷

关键词：

D O I：

10.1063/1.1757782

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An X-ray undulator beamline PF-AR-NW2, which is used for time-resolved XAFS and/or x-ray diffraction experiments and also high-flux XAFS and/or diffraction experiments, has been designed and constructed. The insertion device is an in-vacuum undulator at a period of 40 rum, and the number of periods is 90 in order to cover an energy range of 5 similar to 25 keV. Main optical components are a double-crystal monochromator and a mirror system. The double-crystal monochromator consists of flat Si (111) crystals, which are cooled by liquid nitrogen. The mirror system consists of focusing and cut-off mirror systems. The commissioning has been done successfully. The focused beam size with a bent cylindrical mirror is about 0.21 mm x 0.55 mm for vertically and horizontally with the intensity of 6.4 x 10(12) photons/s at 12.4 keV. The vertical beam size focused with a bent flat mirror is about 0.06 mm. We compare the performance with the values from a ray-tracing calculation.

引用

页码：255 / 258

页数：4