Sheath propagation along the cathode of a plasma opening switch

被引：7

作者：

Fruchtman, A

Grossmann, JM

Swanekamp, SB

Ottinger, PF

机构：

[1] Sci Applicat Int Corp, Mclean, VA 22102 USA

[2] APTI, Washington, DC 20037 USA

[3] JAYCOR, Mclean, VA 22102 USA

[4] USN, Pulsed Power Phys Branch, Div Plasma Phys, Res Lab, Washington, DC 20375 USA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1999年 / 27卷 / 05期

关键词：

Hall effect; opening switch; pulsed power; sheath; vacuum gap;

D O I：

10.1109/27.799827

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A model is proposed for sheath propagation along the cathode of a plasma opening switch that is valid for switch conditions intermediate to the erosion-dominated and MHD-dominated regimes. The model assumes that the sheath propagates due to erosion of the plasma that conducts the current. The calculated velocity of propagation agrees with particle-in-cell simulation results much better than do velocities calculated by previous models that assumed magnetic pressure opens a vacuum gap along the cathode.

引用

页码：1464 / 1468

页数：5

共 16 条

[1]

COOPERSTEIN G, 1987, IEEE T PLASMA SCI, V15, P629

[2] A vacuum sheath propagation along a cathode [J].