Crystallization and grain growth behavior of CoFeB and MgO layers in multilayer magnetic tunnel junctions

被引:26
作者
Mukherjee, Sankha S. [1 ]
Bai, Feiming [1 ]
MacMahon, David [2 ]
Lee, Chih-Ling [3 ]
Gupta, Surendra K. [1 ]
Kurinec, Santosh K. [1 ]
机构
[1] Rochester Inst Technol, Rochester, NY 14623 USA
[2] Micron Technol Inc, Manassas, VA 20110 USA
[3] Veeco Instruments Inc, Fremont, CA 94538 USA
基金
美国国家科学基金会;
关键词
annealing; boron alloys; cobalt alloys; compressive strength; crystallisation; defect states; diffusion; electron energy loss spectra; grain growth; iron alloys; magnetic multilayers; magnetic tunnelling; tensile strength; transmission electron microscopy; vacancies (crystal); X-ray diffraction; MAGNETORESISTANCE; TEMPERATURE; DEPENDENCE;
D O I
10.1063/1.3176501
中图分类号
O59 [应用物理学];
学科分类号
摘要
The relationship between crystallization, grain growth behavior, and the diffusion of B out of CoFeB has been investigated in annealed film stacks of sputtered CoFeB vertical bar MgO using a combination of two dimensional x-ray diffraction, transmission electron microscopy, and parallel electron energy loss spectroscopy (PEELS). The analysis shows grain growth in MgO layers. It shows crystallization at approximately 350 degrees C, and subsequent grain growth in CoFeB layers with annealing. The orientations of the grains of MgO and CoFe are definitively shown to be (002) in the out-of-plane direction. The MgO lattice is seen to have an in-plane tensile stress, while CoFe lattice is shown to have an in-plane compressive stress. CoFe grains are observed to be smaller than MgO grains, rather than being of equal size as previously understood. The physical process of B diffusion into MgO has also been investigated using PEELS and is determined that the diffusion of B through MgO is mediated through vacancies and defect states by the formation of BO(x) complexes.
引用
收藏
页数:7
相关论文
共 31 条
  • [1] Compositional change of MgO barrier and interface in CoFeB/MgO/CoFeB tunnel junction after annealing
    Bae, J. Y.
    Lim, W. C.
    Kim, H. J.
    Lee, T. D.
    Kim, K. W.
    Kim, T. W.
    [J]. JOURNAL OF APPLIED PHYSICS, 2006, 99 (08)
  • [2] Theory of tunneling magnetoresistance for epitaxial systems
    Butler, WH
    Zhang, XG
    Vutukuri, S
    Chshiev, M
    Schulthess, TC
    [J]. IEEE TRANSACTIONS ON MAGNETICS, 2005, 41 (10) : 2645 - 2648
  • [3] BUTLER WH, 2001, PHYS REV B, V60
  • [4] Characterization of CoFeB electrodes for tunnel junctions
    Cardoso, S
    Cavaco, C
    Ferreira, R
    Pereira, L
    Rickart, M
    Freitas, PP
    Franco, N
    Gouveia, J
    Barradas, NP
    [J]. JOURNAL OF APPLIED PHYSICS, 2005, 97 (10)
  • [5] Spatially resolved electron energy-loss spectroscopy of electron-beam grown and sputtered CoFeB/MgO/CoFeB magnetic tunnel junctions
    Cha, Judy J.
    Read, J. C.
    Buhrman, R. A.
    Muller, David A.
    [J]. APPLIED PHYSICS LETTERS, 2007, 91 (06)
  • [6] Transmission electron microscopy study on the polycrystalline CoFeB/MgO/CoFeB based magnetic tunnel junction showing a high tunneling magnetoresistance, predicted in single crystal magnetic tunnel junction
    Choi, Y. S.
    Tsunekawa, K.
    Nagamine, Y.
    Djayaprawira, D.
    [J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (01)
  • [7] Texture development and magnetoresistance properties of CoFeB/MgO/CoFeB-based magnetic tunnel junction depending on capping layer crystallinity
    Chung, Ha-Chang
    Lee, Seong-Rae
    [J]. JOURNAL OF APPLIED PHYSICS, 2008, 103 (07)
  • [8] Cullity B. D., ELEMENTS XRAY DIFFRA
  • [9] Development of the magnetic tunnel junction MRAM at IBM: From first junctions to a 16-Mb MRAM demonstrator chip
    Gallagher, WJ
    Parkin, SSP
    [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2006, 50 (01) : 5 - 23
  • [10] Dependence of giant tunnel magnetoresistance of sputtered CoFeB/MgO/CoFeB magnetic tunnel junctions on MgO barrier thickness and annealing temperature
    Hayakawa, J
    Ikeda, S
    Matsukura, F
    Takahashi, H
    Ohno, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2005, 44 (16-19): : L587 - L589