Fabrication of roll imprint stamp for continuous UV roll imprinting process

被引:28
作者
Hwang, Seon-Yong [1 ]
Hong, Sung-Hoon [1 ]
Jung, Ho-Yong [1 ]
Lee, Heon [1 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
关键词
Roll-to-Roll imprint; Roll stamp; M-PDMS (Methacryloxypropyl terminated poly-dimethylsiloxanes); PVA (poly-vinyl alcohol); Nano imprint lithography; NM HALF-PITCH; NANOIMPRINT LITHOGRAPHY; SUBSTRATE; RESIN;
D O I
10.1016/j.mee.2008.11.055
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recently, nano imprint lithography has been developed for mass production of nano-scale patterns on large-scale substrates. To achieve high throughput and cost reduction, roll-to-roll imprint lithography has been introduced. The roll-to-roll imprint is the suitable process for large area patterning, especially, flexible substrates for display devices. In this study, roll-to-roll imprint stamp is fabricated using polyvinyl alcohol (PVA) mold and UV curable poly-dimethylsiloxanes (PDMS) resin for continuous roll imprinting process. The PVA mold was chosen since it is flexible and can be dissolved in water. Since the PDMS can form thin SiOx layer on the surface by oxygen plasma treatment, silane based hydrophobic anti-stiction layer can be formed directly on the surface of PDMS. As a result, nano-sized patterns were successfully formed on the flexible PET films by UV roll imprinting with the fabricated roll stamp. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:642 / 645
页数:4
相关论文
共 13 条
[1]   High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates [J].
Ahn, Se Hyun ;
Guo, L. Jay .
ADVANCED MATERIALS, 2008, 20 (11) :2044-+
[2]   Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate [J].
Ahn, Se Hyun ;
Kim, Jin-Sung ;
Guo, L. Jay .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06) :2388-2391
[3]   Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns [J].
Ahn, Suho ;
Cha, Joowon ;
Myung, Ho ;
Kim, Seok-min ;
Kang, Shinill .
APPLIED PHYSICS LETTERS, 2006, 89 (21)
[4]   Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography [J].
Ahn, SW ;
Lee, KD ;
Kim, JS ;
Kim, SH ;
Park, JD ;
Lee, SH ;
Yoon, PW .
NANOTECHNOLOGY, 2005, 16 (09) :1874-1877
[5]   Large flexible nanowire grid visible polarizer made by nanoimprint lithography [J].
Chen, Lei ;
Wang, Jian Jim ;
Walters, Frank ;
Deng, Xuegong ;
Buonanno, Mike ;
Tai, Stephen ;
Liu, Xiaoming .
APPLIED PHYSICS LETTERS, 2007, 90 (06)
[6]  
Ge HX, 2005, NANO LETT, V5, P179, DOI [10.1021/nl048618k, 10.1012/nl048618k]
[7]   Fabrication of complex nanoscale structures on various substrates [J].
Han, Kang-Soo ;
Hong, Sung-Hoon ;
Lee, Heon .
APPLIED PHYSICS LETTERS, 2007, 91 (12)
[8]   Control of bubble defects in UV nanoimprint [J].
Hiroshima, Hiroshi ;
Komuro, Masanori .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (9B) :6391-6394
[9]   Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp [J].
Hong, Sung-Hoon ;
Han, Kang-Soo ;
Byeon, Kyeong-Jae ;
Lee, Heon ;
Choi, Kyung-Woo .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (05) :3699-3701
[10]  
Hwang SY, 2008, ELECTRON MATER LETT, V4, P141