Advanced generation of functional dual-periodic microstructured surface based on optical in-process measurement

被引：3

作者：

Takahashi, Satoru ^{[1
]}

Masui, Shuzo ^{[2
]}

Michihata, Masaki ^{[2
]}

Takamasu, Kiyoshi ^{[2
]}

机构：

[1] Univ Tokyo, Res Ctr Adv Sci & Technol, Meguro Ku, Komaba 4-6-1, Tokyo 1538904, Japan

[2] Univ Tokyo, Dept Precis Engn, Bunkyo Ku, Hongo 7-3-1, Tokyo 1138656, Japan

来源：

CIRP ANNALS-MANUFACTURING TECHNOLOGY | 2020年 / 69卷 / 01期

基金：

日本学术振兴会;

关键词：

In-process measurement; Laser micro machining; Micro structure;

D O I：

10.1016/j.cirp.2020.04.076

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In order to realize dual-periodic microstructured surfaces, which are required for next-generation multifunctional surfaces for various fields, multi-exposure laser interference lithography (MELIL) is recognized as one of the potential fabrication methods. However, MELIL has one critical problem that it is difficult to adjust each exposure energy for adequate multiple exposures before the development process. To solve this critical problem, we proposed an application of special optical in-process measurement, allowing us to control each exposure condition properly during its exposure process, and experimentally verified its feasibility by generating a desired dual-periodic microstructured surface using the proposed developed system with an in-process measurement unit. (C) 2020 CIRP. Published by Elsevier Ltd. All rights reserved.

引用

页码：477 / 480

页数：4

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