Effect of annealing process on structures and ferroelectric properties of Ca0.4Sr0.6Bi3.95Nd0.05Ti4O15 thin films

被引:1
作者
Fan Suhua [1 ]
Zhang Wei [1 ]
Wang Peiji [2 ]
Zhang Fengqing [1 ]
Feng Bokai [1 ]
机构
[1] Shandong Jianzhu Univ, Dept Mat Sci & Engn, Jinan 250101, Peoples R China
[2] Jinan Univ, Dept Sci, Jinan 250022, Peoples R China
关键词
Ca0.4Sr0.6Bi3.95Nd0.05Ti4O15 thin films; annealing process; ferroelectric properties; rare earths; BISMUTH; MICROSTRUCTURE; PT/TI/SIO2/SI;
D O I
10.1016/S1002-0721(08)60222-7
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
Ca0.4Sr0.6Bi3.95Nd0.05Ti4O15 (C0.4S0.6BNT) ferroelectric thin films were prepared on Pt/Ti/SiO2/Si substrates by sol-gel method. Effect of annealing process (time and temperature) on structures and ferroelectric properties of C0.4S0.6BNT thin film was investigated. The relative intensity of (200) peak increased first their decreased with annealing temperature and became predominant at 800 degrees C. In contrast, no evident change could be observed in the (001) peak. The remnant polarization (P-r) and coercive field (E-c) for C0.4S0.6BNT film annealed at 800 degrees C for 5 min were 21.6 mu C/cm(2) and 68.3 kV/cm, respectively.
引用
收藏
页码:216 / 221
页数:6
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