Fluorination of tetrafluorobenzenes C(6)HF(4)R with XeF2

被引:7
|
作者
Bardin, VV [1 ]
Shchegoleva, LN [1 ]
Frohn, HJ [1 ]
机构
[1] GERHARD MERCATOR UNIV DUISBURG,FACHGEBIET ANORGAN CHEM,D-47048 DUISBURG,GERMANY
关键词
tetrafluorobenzenes; pentafluorobenzene; xenon difluoride; fluorination; fluorodeprotonation; NMR spectroscopy;
D O I
10.1016/0022-1139(96)03401-X
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Replacement of hydrogen by fluorine and addition of fluorine atoms to the aromatic ring were found in the reaction of XeF2 with 1-R-2,3,4,5-tetrafluorobenzene (R = H, F, Br, NO2) or 1-R-2,3,4,6-tetrafluorobenzene (R = H, CF3) in HF or CH2Cl2-BF3 . OEt(2). Only fluorine addition took place in the case of 1-R-2,3,5,6-tetrafluorobenzenes (R = H, Br, CF3) or 1-Br-2,3,4,6-tetrafluorobenzene. The role of cation radicals as reactive intermediates is discusseed.
引用
收藏
页码:153 / 159
页数:7
相关论文
共 50 条
  • [1] VUV Enhanced XeF2 Fluorination of Polymer Surfaces
    Wheale, S. H.
    Badyal, J. P. S.
    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2012, 26 (18-19) : 2229 - 2237
  • [2] OXIDATIVE FLUORINATION OF SULFUR(IV) COMPOUNDS BY XEF2
    JANZEN, AF
    OU, XB
    JOURNAL OF FLUORINE CHEMISTRY, 1995, 71 (02) : 207 - 207
  • [3] Mitigating graphene etching on SiO2 during fluorination by XeF2
    Copetti, G.
    Nunes, E. H.
    Soares, G. V.
    Radtke, C.
    MATERIALS LETTERS, 2019, 252 : 11 - 14
  • [4] Basal Plane Fluorination of Graphene by XeF2 via a Radical Cation Mechanism
    Liu, Yijun
    Noffke, Benjamin W.
    Qiao, Xiaoxiao
    Li, Qiqi
    Gao, Xinfeng
    Raghavachari, Krishnan
    Li, Liang-shi
    JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2015, 6 (18): : 3645 - 3649
  • [5] Fluorination of silicon carbide thin films using pure F2 gas or XeF2
    Batisse, Nicolas
    Guerin, Katia
    Dubois, Marc
    Hamwi, Andre
    Spinelle, Laurent
    Tomasella, Eric
    THIN SOLID FILMS, 2010, 518 (23) : 6746 - 6751
  • [6] A Raman spectroscopic study of the XeOF4/XeF2 system and the X-ray crystal structure of α-XeOF4•XeF2
    Hughes, Michael J.
    Brock, David S.
    Mercier, Helene P. A.
    Schrobilgen, Gary J.
    JOURNAL OF FLUORINE CHEMISTRY, 2011, 132 (10) : 660 - 668
  • [7] Surface characterization of 3C-SiC exposed to XeF2
    Watanabe, M
    Mori, Y
    Sakai, H
    Iida, T
    Koide, S
    Maeta, E
    Sawabe, K
    Shobatake, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (3A): : L346 - L348
  • [8] Homoleptic [M(XeF2)6]2+ cations of copper(II) and zinc(II) -: Syntheses and crystal.: Structures of [M(XeF2)6](SbF6)2 (M = Cu, Zn)
    Tavcar, Gasper
    Goreshnik, Evgeny
    Mazej, Zoran
    JOURNAL OF FLUORINE CHEMISTRY, 2006, 127 (10) : 1368 - 1373
  • [9] Xenon(IV)-Carbon Bond of [C6F5XeF2]+; Structural Characterization and Bonding of [C6F5XeF2][BF4], [C6F5XeF2}[BF4]•2HF, and [C6F5XeF2][BF4]•nNCCH 3 (n=1, 2); and the Fluorinating Properties of [C6F5XeF2][BF4]
    Koppe, Karsten
    Haner, Jamie
    Mercier, Helene P. A.
    Frohn, Hermann-J.
    Schrobilgen, Gary J.
    INORGANIC CHEMISTRY, 2014, 53 (21) : 11640 - 11661
  • [10] Study of XeF2 fluorination potential against SrO, MoO3, and Nb2O5 in TG/DTA for use in reactive gas recycle
    Inabinett, D.
    Knight, T.
    Adams, T.
    Gray, J.
    PROGRESS IN NUCLEAR ENERGY, 2013, 68 : 16 - 19