Fabrication of capacitive ultrasonic transducers by a low temperature and fully surface-micromachined process

被引:16
作者
Cianci, E
Foglietti, V
Memmi, D
Caliano, G
Caronti, A
Pappalardo, M
机构
[1] CNR, IESS, I-00156 Rome, Italy
[2] Univ Rome TRE, Dip Ingn Elettron, I-00146 Rome, Italy
来源
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY | 2002年 / 26卷 / 04期
关键词
capacitive transducer; surface micromachining; low temperature process; thermal annealing;
D O I
10.1016/S0141-6359(02)00113-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The fabrication of capacitive ultrasonic transducers by means of surface micromachining techniques and a low-temperature process is presented. Investigation of main process steps is reported. The use of polyimide as sacrificial layer, possible as the process is at low temperature, guarantees precise control of active transducer cells, thanks to its etching selectivity against the structural materials employed, and to the lithographic definition of the sacrificial layer into islands before the deposition of the membrane layer (pre-patterning). Control of the mechanical properties of free-standing membranes has been gained with the optimization of silicon nitride deposition and following thermal annealing steps. Transducers have been characterized by electrical impedance analysis, and their behavior agrees with theoretical modeling. (C) 2002 Elsevier Science Inc. All rights reserved.
引用
收藏
页码:347 / 354
页数:8
相关论文
共 19 条
[1]   A silicon microfabricated electrostatic transducer: 1 MHz transmission in air and in water [J].
Caliano, G ;
Foglietti, V ;
Cianci, E ;
Pappalardo, M .
MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) :573-576
[2]   An accurate model for capacitive micromachined ultrasonic transducers [J].
Caronti, A ;
Caliano, G ;
Iula, A ;
Pappalardo, M .
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 2002, 49 (02) :159-168
[3]  
Chanhome L, 1999, J NAT TOXINS, V8, P135, DOI 10.1109/84.767109
[4]   INFLUENCE OF DEPOSITION TEMPERATURE, GAS-PRESSURE, GAS-PHASE COMPOSITION, AND RF FREQUENCY ON COMPOSITION AND MECHANICAL-STRESS OF PLASMA SILICON-NITRIDE LAYERS [J].
CLAASSEN, WAP ;
VALKENBURG, WGJN ;
WILLEMSEN, MFC ;
VANDERWIJGERT, WM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (04) :893-898
[5]  
Eccardt PC, 1997, 1997 IEEE ULTRASONICS SYMPOSIUM PROCEEDINGS, VOLS 1 & 2, P1609, DOI 10.1109/ULTSYM.1997.663304
[6]   Micromachined ultrasound transducers with improved coupling factors from a CMOS compatible process [J].
Eccardt, PC ;
Niederer, K .
ULTRASONICS, 2000, 38 (1-8) :774-780
[7]   Low temperature plasma deposition of silicon nitride from silane and nitrogen plasmas [J].
Hanyaloglu, BF ;
Aydil, ES .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1998, 16 (05) :2794-2803
[8]   An evaluation of 1-3 connectivity composite transducers for air-coupled ultrasonic applications [J].
Hayward, G ;
Gachagan, A .
JOURNAL OF THE ACOUSTICAL SOCIETY OF AMERICA, 1996, 99 (04) :2148-2157
[9]   Fabrication and characterization of surface micromachined capacitive ultrasonic immersion transducers [J].
Jin, XC ;
Ladabaum, I ;
Degertekin, FL ;
Calmes, S ;
Khuri-Yakub, BT .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1999, 8 (01) :100-114
[10]   Surface micromachined capacitive ultrasonic transducers [J].
Ladabaum, I ;
Jin, XC ;
Soh, HT ;
Atalar, A ;
Khuri-Yakub, BT .
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 1998, 45 (03) :678-690