High-voltage field effect transistors with wide-bandgap β-Ga2O3 nanomembranes (vol 104, 203111, 2014)

被引:12
作者
Hwang, Wan Sik [1 ]
Verma, Amit [2 ]
Peelaers, Hartwin [3 ]
Protasenko, Vladimir [2 ]
Rouvimov, Sergei [2 ]
Xing, Huili [2 ]
Seabaugh, Alan [2 ]
Haensch, Wilfried [4 ]
Van de Walle, Chris [3 ]
Galazka, Zbigniew [5 ]
Albrecht, Martin [5 ]
Fornari, Roberto [5 ,6 ]
Jena, Debdeep [2 ]
机构
[1] Korea Aerosp Univ, Dept Mat Engn, Gyeonggi 412791, South Korea
[2] Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA
[3] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[4] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[5] Leibniz Inst Crystal Growth, D-12489 Berlin, Germany
[6] Univ Parma, Dept Phys & Earth Sci, I-43124 Parma, Italy
关键词
D O I
10.1063/1.4884096
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页数:1
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[1]   High-voltage field effect transistors with wide-bandgap β-Ga2O3 nanomembranes [J].
Hwang, Wan Sik ;
Verma, Amit ;
Peelaers, Hartwin ;
Protasenko, Vladimir ;
Rouvimov, Sergei ;
Xing, Huili ;
Seabaugh, Alan ;
Haensch, Wilfried ;
Van de Walle, Chris G. ;
Galazka, Zbigniew ;
Albrecht, Martin ;
Fornari, Roberto ;
Jena, Debdeep .
APPLIED PHYSICS LETTERS, 2014, 104 (20)