Total-electron-yield X-ray standing-wave measurements of multilayer X-ray mirrors for interface structure evaluation

被引：9
|
作者：
Muramatsu, Y
Takenaka, H
Gullikson, EM
Perera, RCC
机构：
[1] Japan Atom Energy Res Inst, Mikazuki, Hyogo 6795148, Japan
[2] NTT Corp, Adv Technol Corp, Tokai, Ibaraki 3191106, Japan
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2002年 / 41卷 / 6B期
关键词：
D O I：
10.1143/JJAP.41.4250
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Total-electron-yield (TEY) X-ray standing-wave measurements of multilayer X-ray mirrors by monitoring sample photocurrent have been performed to obtain information on their layer/interface structure. This simple TEY X-ray standing-wave method enables simultaneous spectral measurement of the X-ray standing-wave and Bragg reflection, From simultaneous measurement of TEY X-ray standing-wave and Bragg reflection spectra of Mo/SiC/Si multilayers, shrinkage of the layer structure Was observed along with disordering at the interface by annealing. Mapping measurements of the X-ray standing-wave signals in a Mo/Si multilayer can also be achieved on normal incidence, visibly illustrating the spatial distribution of interface structure in the sample plane.
引用
收藏
页码：4250 / 4252
页数：3
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