Engineering of Germanium Tunnel Junctions for Optical Applications

被引:3
|
作者
Koerner, Roman [1 ,2 ]
Fischer, Inga Anita [1 ]
Schwarz, Daniel [1 ]
Clausen, Caterina Johanna [1 ]
Hoppe, Niklas [3 ]
Schulze, Joerg [1 ]
机构
[1] Univ Stuttgart, Inst Semicond Engn IHT, D-70569 Stuttgart, Germany
[2] Philips Photon, D-89081 Ulm, Germany
[3] Univ Stuttgart, Inst Elect & Opt Commun Engn INT, D-70569 Stuttgart, Germany
来源
IEEE PHOTONICS JOURNAL | 2018年 / 10卷 / 02期
关键词
Zener-emitter; silicon photonics; tunnel injection; Zener tunneling; integrated optical devices; germanium; INFRARED-ABSORPTION; SILICON PHOTONICS; QUANTUM-WELL; ON-CHIP; DIODES; TIME; SI; SEMICONDUCTORS; SPECTROSCOPY; COEFFICIENT;
D O I
10.1109/JPHOT.2018.2818662
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Data transfer across millimeter-scale electrical wires is limited by both data rates and power density, which creates a performance bottleneck for semiconductor microchips in modern computer systems. Hence, silicon based platforms for optical communication are diligently explored for an on-chip optical data transfer. Semiconductor optical amplifiers provide signal recovery and loss compensation in advanced photonic circuits and are, thus, indispensable components for such platforms. However, silicon photonic components have to operate at much lower voltages and energy-per-bit metrics before it is worth integrating them on-chip with a CPU. The usage of tunnel junctions to control carrier injection can provide a fast and energy-saving alternative. Here, we present experimental results on direct conduction band carrier modulation in the indirect semiconductor Ge by Zener tunnel injection. Electrons are injected by a reverse-biased p-n Zener tunnel diode and recombine radiatively with holes injected by a forward biased p-i-n diode. This injection mechanism favors tunneling of electrons into the direct conduction band valley with concomitant improvements of optoelectronic properties. Benchmarking the performance, 2.42 dB transmission change at 0.9 V bias (1660 nm) at 300 K confirm the working principle. Our device can serve as a starting point to investigate the benefits of tunnel injection for silicon photonic devices.
引用
收藏
页数:12
相关论文
共 50 条
  • [1] Engineering of tunnel junctions for prospective spin injection in germanium
    Zhou, Yi
    Ogawa, Masaaki
    Bao, Mingqiang
    Han, Wei
    Kawakami, Roland K.
    Wang, Kang L.
    APPLIED PHYSICS LETTERS, 2009, 94 (24)
  • [2] ON EFFECTS OF CU ON AS DOPED GERMANIUM TUNNEL JUNCTIONS
    SATO, H
    IMAI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1966, 5 (11) : 1117 - &
  • [3] Rapid melt growth of germanium tunnel junctions
    Zhao, Jialin
    Seabaugh, Alan C.
    Kosel, Thomas H.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (06) : H536 - H539
  • [4] Magnetic tunnel junctions and their applications
    Stobiecki, Tomasz
    OPTOELECTRONIC AND ELECTRONIC SENSORS VI, 2006, 6348
  • [5] SELECTED PROPERTIES OF AMORPHOUS GERMANIUM AND SILICON TUNNEL JUNCTIONS
    CLARK, AH
    SMITH, CW
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1971, 16 (03): : 304 - &
  • [6] Magnetic tunnel junctions - principles and applications
    Samant, MG
    Parkin, SSP
    VACUUM, 2004, 74 (3-4) : 705 - 709
  • [7] Transmittance of subwavelength optical tunnel junctions
    Girard, C
    PHYSICAL REVIEW B, 1998, 58 (19): : 12551 - 12554
  • [8] IMPURITY DIFFUSION AND DRIFT IN GERMANIUM TUNNEL-DIODE JUNCTIONS
    BUCKINGHAM, JH
    HULME, KF
    MORGAN, JR
    SOLID-STATE ELECTRONICS, 1963, 6 (03) : 233 - 244
  • [9] Engineering tunnel junctions on ballistic semiconductor nanowires
    Damasco, J.
    Gill, S. T.
    Gazibegovic, S.
    Badawy, G.
    Bakkers, E. P. A. M.
    Mason, N.
    APPLIED PHYSICS LETTERS, 2019, 115 (04)
  • [10] Resonant band engineering of ferroelectric tunnel junctions
    Su, Jing
    Zheng, Xingwen
    Wen, Zheng
    Li, Tao
    Xie, Shijie
    Rabe, Karin M.
    Liu, Xiaohui
    Tsymbal, Evgeny Y.
    PHYSICAL REVIEW B, 2021, 104 (06)