Effect of bias voltage on the structure and hardness of Ti-Si-N composite coatings synthesized by cathodic arc assisted middle-frequency magnetron sputtering

被引：32
作者：
Yang, Z. T. [1 ]
Yang, B. [2 ]
Guo, L. P. [1 ]
Fu, D. J. [1 ]
机构：
[1] Wuhan Univ, Dept Phys, Accelerator Lab, Wuhan 430072, Peoples R China
[2] Wuhan Univ, Power & Mech Engn Sch, Wuhan 430072, Peoples R China
来源：
JOURNAL OF ALLOYS AND COMPOUNDS | 2009年 / 473卷 / 1-2期
基金：
中国国家自然科学基金;
关键词：
Ti-Si-N composite coatings; Bias voltage; Microstructure; Hardness; MECHANICAL-PROPERTIES; FILMS; MICROSTRUCTURE; DEPOSITION; EVAPORATION; SYSTEM;
D O I：
10.1016/j.jallcom.2008.06.003
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Ti-Si-N nanocomposite coatings were synthesized by using an industrial scale cathodic arc assisted middle-firequency magnetron sputtering system. The influence of substrate bias voltage on the microstructure, hardness, and surface morphology was investigated. Specifically, the composite coatings prepared at an optimized bias voltage of 150 V were found to be nc-TiN/a-Si3N4 structure with TiN crystalline grain sizes ranging from 8 to 15 nm and exhibit a hardness of 40 GPa and roughness of 4 nm. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：437 / 441
页数：5
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