Mapping substrate/film adhesion with contact-resonance-frequency atomic force microscopy

被引：49
|
作者：
Hurley, D. C. [1 ]
Kopycinska-Muller, M. [1 ]
Langlois, E. D. [1 ]
Kos, A. B. [1 ]
Barbosa, N., III [1 ]
机构：
[1] Natl Inst Stand & Technol, Boulder, CO 80305 USA
来源：
APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 02期
关键词：
ACOUSTIC MICROSCOPY; ELASTIC PROPERTIES; STIFFNESS; DISPLACEMENT; CANTILEVERS;
D O I：
10.1063/1.2221404
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have used contact-resonance-frequency atomic force microscopy techniques to nondestructively image variations in adhesion at a buried interface. Images were acquired on a sample containing a 20 mn gold (An) blanket film on silicon (Si) with a 1 nm patterned interlayer of titanium (Ti). This design produced regions of very weak adhesion (Si/Au) and regions of strong adhesion (Si/Ti/Au). Values of the contact stiffness were 5% lower in the regions of weak adhesion. The observed behavior is consistent with theoretical predictions for layered systems with disbonds. Our results represent progress towards quantitative measurement of adhesion parameters on the nanoscale.
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页数：3
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