Properties of copper-aluminum oxide films prepared by solution methods

被引：108

作者：

Tonooka, K

Shimokawa, K

Nishimura, O

机构：

[1] Natl Inst Adv Ind Sci & Technol, AIST Tsukuba Cent 2, Nanoelect Res Inst, Tsukuba, Ibaraki 3058568, Japan

[2] Natl Inst Adv Ind Sci & Technol, Res Inst Biol Resources, Sapporo, Hokkaido 0628517, Japan

来源：

THIN SOLID FILMS | 2002年 / 411卷 / 01期

关键词：

CuAlO2; films; solution method; dip-coating; transparent conducting oxide;

D O I：

10.1016/S0040-6090(02)00201-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Conducting copper-aluminum oxide films have been prepared by employing the dip-coating method. Metal alkoxides and nitrates were examined as metal sources in the precursor solutions for the preparation of CuAlO2 samples based on the procedures of sol-gel and nitrate processes, respectively. Fired samples were investigated by X-ray diffraction (XRD), thermogravimetric analysis and electrical measurements. Properties of the samples depended on the calcination temperature and the composition of the precursor solution. Electrical conductance of the samples corresponds well with the delafossite CuAlO2 content, which was determined by the intensity of corresponding lines in the XRD patterns. The lowest sheet resistance (approximate to45 Omega/square) was obtained for a film sample prepared by the nitrate process followed by a calcination at 1100 degreesC for 4 h in air. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：129 / 133

页数：5