A 23.8-GHz SOICMOS tuned amplifier

被引:33
作者
Floyd, BA [2 ]
Shi, L
Taur, Y
Lagnado, I
O, KK
机构
[1] Univ Florida, Dept Elect & Comp Engn, Silicon Microwave Integrated Circuits & Syst Res, Gainesville, FL 32611 USA
[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
[3] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
[4] Space & Naval Warface Syst Ctr, San Diego, CA 92152 USA
关键词
CMOS; K-band; low-noise amplifier; negative resistance; silicon-on-insulator; SOI; spiral inductor; tuned amplifier;
D O I
10.1109/TMTT.2002.802334
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A 23.8-GHz tuned amplifier is demonstrated in a partially scaled 0.1-mum silicon-on-insulator CMOS technology. The fully integrated three-stage amplifier employs a common-gate, source-follower, and cascode with on-chip spiral inductors and MOS capacitors. The gain is 7.3 dB, while input and output reflection coefficients are -45 and -9.4 dB, respectively. Positive gain is exhibited beyond 26 GHz. The amplifier draws 53 mA from a 1.5-V supply. The measured on-wafer noise figure is 10 dB, while the input-referred third-order intercept point is -7.8 dBm. The results demonstrate that 0.1-mum CMOS technology may be used for 20-GHz RF applications and suggest even higher operating frequencies and better performance for further scaled technologies.
引用
收藏
页码:2193 / 2196
页数:4
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