Effect of annealing conditions on in situ formation of Cr2O3 diffusion barrier

被引：9
|
作者：
Xu, Y. -X. [1 ]
Luo, X. -T. [1 ]
Li, C. -X. [1 ]
Yang, G. -J. [1 ]
Li, C. -J. [1 ]
机构：
[1] Xi An Jiao Tong Univ, Sch Mat Sci & Engn, State Key Lab Mech Behav Mat, Xian 710049, Shaanxi Provinc, Peoples R China
来源：
SURFACE ENGINEERING | 2017年 / 33卷 / 03期
基金：
中国博士后科学基金;
关键词：
Cr2O3; Diffusion barrier; Annealing; Growth kinetics; Optimisation; OXIDATION BEHAVIOR; STAINLESS-STEEL; COATINGS; NITROGEN; SILICON; ALLOY;
D O I：
10.1080/02670844.2016.1202672
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The previous investigation suggested the approach for an in situ formation of Cr2O3 diffusion barrier by annealing the cold-sprayed Ni coatings on 310SS. In this paper, the influences of annealing conditions on the growth kinetics of Cr2O3 and substrate microstructure were investigated. Results show that Cr2O3 formed at the selected annealing temperatures of 850, 900 and 950 degrees C for different durations of 4, 8 and 20 h. Increasing temperature enhanced the growth kinetics of Cr2O3 and the Mn content in the oxide layer. The annealing process for the growth of Cr2O3 improves the coating adhesion compared to the as-deposited coating. However, annealing at 950 degrees C resulted in the precipitation of chromium carbides and enhanced the element inter-diffusion across the substrate/coating interface.
引用
收藏
页码：210 / 216
页数：7
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