Characterization of (1120) textured ZnO films fabricated by RF magnetron sputtering

被引:28
|
作者
Yanagitani, T [1 ]
Tomohiro, S [1 ]
Nohara, T [1 ]
Matsukawa, M [1 ]
Watanabe, Y [1 ]
Otani, T [1 ]
机构
[1] Doshisha Univ, Fac Engn, Kyotanabe, Kyoto 6100321, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2004年 / 43卷 / 5B期
关键词
(1120) textured ZnO film; shear wave transducer; Brillouin scattering method; RF magnetron sputtering; pole figure analysis;
D O I
10.1143/JJAP.43.3004
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using a conventional RF magnetron sputtering system, we have obtained two types of ZnO films on various kinds of substrate. One is a film with the c-axes of crystallites unidirectionally aligned in the substrate plane {(11 (2) over bar0) textured film}. The other is a film with c-axes parallel and perpendicular to the plane (mixed texture film). The former is expected to realize a shear wave transducer on the surfaces of various materials. The alignment of c-axes of crystallites in the plane was then carefully investigated by the X-ray pole figure analysis. The elastic anisotropy in the film has been successfully measured by the Brillouin scattering method. The (11 (2) over bar0) textured film did not excite the elastic waves; however, comparatively strong shear waves were actually excited by the mixed texture film.
引用
收藏
页码:3004 / 3007
页数:4
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