Effect of laser wavelength on phase and microstructure of TiO2 films prepared by laser chemical vapor deposition

被引：8

作者：

Gao, Ming ^{[1
]}

Ito, Akihiko ^{[1
]}

Goto, Takashi ^{[1
]}

机构：

[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2014年 / 244卷

基金：

日本学术振兴会;

关键词：

Laser CVD; Anatase; Rutile; Thick film; THIN-FILMS; CVD; ANATASE; GROWTH; MOCVD; TEMPERATURE; MORPHOLOGY; CO2-LASER; TITANIA; PRECURSOR;

D O I：

10.1016/j.surfcoat.2014.02.003

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Rutile and anatase TiO2 films were prepared by laser chemical vapor deposition using CO2 and Nd:YAG lasers. The effects of laser wavelength on the phase, orientation, and microstructure of these TiO2 films were investigated. Using a CO2 laser, single-phase rutile TiO2 films were obtained at 826-1225 K. These films showed a (100) orientation and a dense structure. The highest deposition rate was 83 mu M h(-1) at 1070 K. Using a Nd:YAG laser, the phase of the TiO2 films changed from rutile to anatase with increasing deposition temperature from 852 to 1230 K. The rutile TiO2 films showed a (100) orientation with a columnar structure, while the anatase TiO2 films exhibited a (001) orientation with a cauliflower-like structure. Using a Nd:YAG laser, the highest deposition rates for rutile and anatase TiO2 films were 142 and 40 mu m h(-1), respectively. (C) 2014 Elsevier B.V. All rights

引用

页码：166 / 172

页数：7

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