Turbostratic boron carbonitride films produced by bias-assisted hot filament chemical vapor deposition

被引:42
|
作者
Yu, J [1 ]
Wang, EG
Ahn, J
Yoon, SF
Zhang, Q
Cui, J
Yu, MB
机构
[1] Nanyang Technol Univ, Ctr Microelect, Singapore 639798, Singapore
[2] Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
关键词
D O I
10.1063/1.372456
中图分类号
O59 [应用物理学];
学科分类号
摘要
Boron carbonitride (BCN) films with various compositions have been prepared by bias-assisted hot filament chemical vapor deposition. The three elements of B, C, and N are chemically bonded with each other and an atomic-level BCN hybrid has been formed in the films. The deposited films are composed of turbostratic structural regions ranging from a few to a few tens of nanometers. Besides, there exist some amorphous domains in the films. Boron atoms have been confirmed to be incorporated into the films with a concentration up to 70 at. %. The interplanar spacing of 3.49 A is found to be independent of the film composition in this range. These films show a blueshift in photoluminescence peak with increasing B content. These findings show that the electronic structure of BCN compounds can be controlled by changing compositions and the BCN compounds are blue-light emitting materials. (C) 2000 American Institute of Physics. [S0021-8979(00)02208-8].
引用
收藏
页码:4022 / 4025
页数:4
相关论文
共 50 条
  • [41] SYNTHESIS OF DIAMOND THIN-FILMS BY HOT-FILAMENT-ASSISTED CHEMICAL VAPOR-DEPOSITION
    BONNOT, AM
    THIN SOLID FILMS, 1990, 185 (01) : 111 - 121
  • [42] Growth and characterization of diamond films deposited by dc discharge assisted hot filament chemical vapor deposition
    Cui, JB
    Shang, NG
    Liao, Y
    Li, JQ
    Fang, RC
    THIN SOLID FILMS, 1998, 334 (1-2) : 156 - 160
  • [43] NUCLEATION AND GROWTH OF DIAMOND IN HOT FILAMENT ASSISTED CHEMICAL VAPOR-DEPOSITION
    HYER, RC
    GREEN, M
    MISHRA, KK
    SHARMA, SC
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1991, 10 (09) : 515 - 518
  • [44] Evidence of the role of positive bias in diamond growth by hot filament chemical vapor deposition
    Cui, JB
    Fang, RC
    APPLIED PHYSICS LETTERS, 1996, 69 (23) : 3507 - 3509
  • [45] Transverse bias-enhanced nucleation of diamond in hot filament chemical vapor deposition
    Shang, NG
    Fang, RC
    Han, S
    Liao, Y
    Cui, JB
    MATERIALS RESEARCH INNOVATIONS, 1998, 2 (02) : 79 - 82
  • [46] Hot-filament-enhanced chemical vapor deposition of silicon oxide films
    Chávez, F
    Bravo-García, YE
    Silva-Andrade, F
    Galindo, A
    MATERIALS LETTERS, 2000, 43 (5-6) : 324 - 328
  • [47] Doping of vanadium to nanocrystalline diamond films by hot filament chemical vapor deposition
    Zhang, Yaozhong
    Zhang, Liying
    Zhao, Jiang
    Wang, Liang
    Zhao, Gang
    Zhang, Yafei
    NANOSCALE RESEARCH LETTERS, 2012, 7
  • [48] Doping of vanadium to nanocrystalline diamond films by hot filament chemical vapor deposition
    Yaozhong Zhang
    Liying Zhang
    Jiang Zhao
    Liang Wang
    Gang Zhao
    Yafei Zhang
    Nanoscale Research Letters, 7
  • [49] Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films
    Lau, KKS
    Gleason, KK
    JOURNAL OF FLUORINE CHEMISTRY, 2000, 104 (01) : 119 - 126
  • [50] Thermal annealing of fluorocarbon films grown by hot filament chemical vapor deposition
    Lau, KKS
    Gleason, KK
    JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (12): : 2303 - 2307