Design, realization and testing of micro-mechanical resonators in thick-film silicon technology with postprocess electrode-to-resonator gap reduction

被引:30
作者
Galayko, D
Kaiser, A
Buchaillot, L
Legrand, B
Collard, D
Combi, C
机构
[1] IEMN, UMR CNRS 8520, ISEN, F-59046 Lille, France
[2] CIRMM, ISS Univ Tokyo, F-59652 Villeneuve Dascq, France
[3] St Microelect, I-20010 Milan, Italy
关键词
D O I
10.1088/0960-1317/13/1/319
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the design, fabrication and testing of high-Q high-frequency lateral-mode clamped-clamped beam micro-resonators driven by parallel-plate electrostatic transducers fabricated in a thick epipoly technology. An innovative approach is employed to reduce an intrinsically high transducer gap value (>3.0 mum) required by the need of 15 mum thick structural layer etching down to 0.2-0.4 mum after the fabrication. This is achieved by employing an electrostatic motor that approaches the actuating and sensing electrodes close to the resonator. The electrode motor is driven with 30 V dc voltage. without any dc current consumption. Two resonators having a resonance frequency of 10 MHz have been fabricated with gap values of 0.2 and 0.4 mum respectively. A comparative analysis of performances of the two resonators is given in the paper.
引用
收藏
页码:134 / 140
页数:7
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