Glow-discharge-driven bucket ion source

被引:10
作者
Gavrilov, NV [1 ]
Kamenetskikh, AS [1 ]
机构
[1] Russian Acad Sci, Inst Electrophys, Ekaterinburg 620016, Russia
关键词
D O I
10.1063/1.1699527
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A two-stage source of broad beams of gaseous ions employing a glow-discharge plasma cathode and an anode chamber with a peripheral multicusp magnetic field has been studied. A grid, whose potential approached the potential of the screen grid of the ion source, separated the cathode and anode stages. The effect of the energy (0-300 eV), the current of injected electrons (0.2-0.8 A), and the gas pressure (argon) on the plasma parameters and the efficiency of ions extraction from the plasma have been analyzed. The current density of the ions extracted from the magnetic-field-free plasma had a nearly homogeneous distribution (similar to10%). The beam of 3 keV argon ions was generated using a two-electrode ion optical system with the area of similar to50 cm(2). The beam current was 60 mA at the electron current of the plasma cathode equal to 0.2 A. (C) 2004 American Institute of Physics.
引用
收藏
页码:1875 / 1877
页数:3
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[31]   ION BOMBARDMENT OF SILICON IN A GLOW DISCHARGE [J].
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