Measuring system for radiation pulses from gas-puff laser-plasma source

被引:0
作者
Bielecki, Zbigniew [1 ]
Mikolajczyk, Janusz [1 ]
Rakowski, Rafal [1 ]
Wojtas, Jacek [1 ]
机构
[1] Mil Univ Technol, Inst Optoelect, Warsaw, Poland
来源
OPTICAL SENSING II | 2006年 / 6189卷
关键词
EUV radiation; EUV metrology; detection of optical signals;
D O I
10.1117/12.663240
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The paper presents a measuring system of extreme ultraviolet radiation pulses (13.5 nm). The system is used for monitoring a gas-puff laser-plasma source constructed at the Institute of Optoelectronics. The radiation source and the system are used in metrology of EUV optics. The system consists of a detection head and a system of optical filters, which are housing in a special construction. Additional element of the measuring system is a special processing unit. The measuring system was used during investigations of the plasma-laser optimization. The results were comparable with the ones from a spectrograph and an Emon energy meter.
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页数:6
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