Sub-Parts-per-Trillion Level Detection of Analytes by Superhydrophobic Preconcentration Paper Spray Ionization Mass Spectrometry (SHPPSI MS)
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作者:
Basuri, Pallab
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Indian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, India
Basuri, Pallab
[1
]
Baidya, Avijit
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Indian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, India
Baidya, Avijit
[1
]
Pradeep, Thalappil
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Indian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, India
Pradeep, Thalappil
[1
]
机构:
[1] Indian Inst Technol Madras, Dept Chem, DST Unit Nanosci DST UNS, TUE, Chennai 600036, Tamil Nadu, India
A new kind of ambient ionization method named superhydrophobic preconcentration paper spray ionization mass spectrometry (SHPPSI MS) is introduced, where superhydrophobicity and paper spray mass spectrometry (PS MS) are coupled. The SHPPSI MS requires only microliter amounts of analyte solutions, allows easy sampling procedure, and provides high sensitivity for a diverse array of analytes. It can be used to detect food adulteration at extremely low concentrations. The experimental methodology involves modifying one of the surfaces of a triangularly cut filter paper to make it acquire low surface energy by drop casting a green and ecofriendly superhydrophobic coating material over it followed by drying. A micrometer scale defect was made at close proximity to one of the tips of the paper using a pin. Preconcentration of the sample was accomplished by allowing a 10 mu L droplet of an aqueous solution of the analyte to stand at the defect followed by drying naturally. The dried paper was used as the substrate for paper spray mass spectrometry by eluting the analyte with a suitable solvent. This novel technique was used to detect melamine in adulterated milk, whose detection at the ppt level in milk normally needs sophisticated instruments, a larger amount of sample, and a complex sampling procedure, including further purification and separation. The SHPPSI MS detects melamine directly from milk at the sub-ppb level by simply putting a microdroplet of adulterated milk at the substrate and eluting the sample with methanol. This paper-based technique can be a promising tool for direct sensing of analytes such as drugs in body fluids, pesticides in water and soil, etc.
机构:
Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Aalto Univ, Dept Appl Phys, Sch Sci, Puumiehenkuja 2, Espoo 02150, Finland
Indian Inst Technol, Dept Mech Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Baidya, Avijit
;
Ganayee, Mohd Azhardin
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Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Ganayee, Mohd Azhardin
;
Ravindran, Swathy Jakka
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Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Ravindran, Swathy Jakka
;
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Tam, Kam Chiu
;
Das, Sarit Kumar
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Indian Inst Technol, Dept Mech Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Das, Sarit Kumar
;
Ras, Robin H. A.
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Aalto Univ, Dept Appl Phys, Sch Sci, Puumiehenkuja 2, Espoo 02150, FinlandIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Ras, Robin H. A.
;
Pradeep, Thalappil
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Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
机构:
US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Bandele, O. J.
;
Stine, C. B.
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US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Stine, C. B.
;
Ferguson, M.
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US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Ferguson, M.
;
Black, T.
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US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Black, T.
;
Olejnik, N.
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US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Olejnik, N.
;
Keltner, Z.
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US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Keltner, Z.
;
Evans, E. R.
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US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Evans, E. R.
;
Crosby, T. C.
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US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Crosby, T. C.
;
Reimschuessel, R.
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US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Reimschuessel, R.
;
Sprando, R. L.
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US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
机构:
Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
Basuri, Pallab
;
Sarkar, Depanjan
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Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
Sarkar, Depanjan
;
Paramasivam, Ganesan
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Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
Paramasivam, Ganesan
;
Pradeep, Thalappil
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Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
机构:
Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Aalto Univ, Dept Appl Phys, Sch Sci, Puumiehenkuja 2, Espoo 02150, Finland
Indian Inst Technol, Dept Mech Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Baidya, Avijit
;
Ganayee, Mohd Azhardin
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h-index: 0
机构:
Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Ganayee, Mohd Azhardin
;
Ravindran, Swathy Jakka
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h-index: 0
机构:
Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Ravindran, Swathy Jakka
;
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机构:
Tam, Kam Chiu
;
Das, Sarit Kumar
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol, Dept Mech Engn, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Das, Sarit Kumar
;
Ras, Robin H. A.
论文数: 0引用数: 0
h-index: 0
机构:
Aalto Univ, Dept Appl Phys, Sch Sci, Puumiehenkuja 2, Espoo 02150, FinlandIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
Ras, Robin H. A.
;
Pradeep, Thalappil
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, DST Unit Nanosci, Themat Unit Excellence, Dept Chem, Madras 600036, Tamil Nadu, India
机构:
US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Bandele, O. J.
;
Stine, C. B.
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h-index: 0
机构:
US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Stine, C. B.
;
Ferguson, M.
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h-index: 0
机构:
US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Ferguson, M.
;
Black, T.
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h-index: 0
机构:
US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Black, T.
;
Olejnik, N.
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h-index: 0
机构:
US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Olejnik, N.
;
Keltner, Z.
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h-index: 0
机构:
US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Keltner, Z.
;
Evans, E. R.
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h-index: 0
机构:
US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Evans, E. R.
;
Crosby, T. C.
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h-index: 0
机构:
US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Crosby, T. C.
;
Reimschuessel, R.
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h-index: 0
机构:
US FDA, Div Appl Vet Res, Res Off, CVM, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
Reimschuessel, R.
;
Sprando, R. L.
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h-index: 0
机构:
US FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USAUS FDA, Div Toxicol, Off Appl Res & Safety Assessment, CFSAN, Laurel, MD USA
机构:
Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
Basuri, Pallab
;
Sarkar, Depanjan
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
Sarkar, Depanjan
;
Paramasivam, Ganesan
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India
Paramasivam, Ganesan
;
Pradeep, Thalappil
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol Madras, Themat Unit Excellence, DST Unit Nanosci DST UNS, Madras 600036, Tamil Nadu, India