An Investigation of Electrical and Dielectric Parameters of Sol-Gel Process Enabled β-Ga2O3 as a Gate Dielectric Material

被引:34
作者
Kaya, Ahmet [1 ]
Mao, Howard [1 ]
Gao, Jianyi [1 ]
Chopdekar, Rajesh V. [2 ]
Takamura, Yayoi [2 ]
Chowdhury, Srabanti [1 ]
Islam, M. Saif [1 ]
机构
[1] Univ Calif Davis, Dept Elect & Comp Engn, Davis, CA 95616 USA
[2] Univ Calif Davis, Dept Mat Sci & Engn, Davis, CA 95616 USA
关键词
beta-Ga2O3 dielectric film; dielectric properties; electrical properties; IMPEDANCE SPECTROSCOPY; GALLIUM OXIDE; RELAXATION; LAYER; FILMS; CONDUCTIVITY;
D O I
10.1109/TED.2017.2675990
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, beta-Ga2O3 thin films were grown on a p-Si substrate using the sol-gel method. Structural characterization of the films was performed using X-ray diffraction. Electrical parameters such as breakdown field, interface traps density (D-it), and series resistance (R-s) were investigated at room temperature. The interface trap density was found to be 10(12) eV(-1)cm(-2) using the Hill-Colemanmethod. This result is valuable forMOS capacitor applications. Dielectric parameters were investigated in the wide frequency range (20 kHz-1 MHz) at room temperature. We observed that these parameters have a strong dependence on frequency and voltage.
引用
收藏
页码:2047 / 2053
页数:7
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