Influence of deposition time on the properties of ZnS/p-Si heterostructures

被引:57
作者
Kumar, Arun [1 ]
Mukherjee, Samrat [2 ]
Sahare, Sanjay [3 ]
Choubey, Ravi Kant [1 ]
机构
[1] Amity Univ, Amity Inst Appl Sci AIAS, Dept Appl Phys, Noida Campus,Sect 125, Noida 201313, Uttar Pradesh, India
[2] Natl Inst Technol, Dept Phys, Patna 800005, Bihar, India
[3] Shenzhen Univ, Inst Adv Study, Shenzhen, Guangdong, Peoples R China
关键词
Chemical bath deposition; ZnS thin Films; Photoluminescence; Ideality factor; CURRENT-VOLTAGE CHARACTERISTICS; CDS THIN-FILMS; H-2; EVOLUTION; SOLAR-CELL; SCHOTTKY; LAYER; NANOPARTICLES; NANOSTRUCTURES; TEMPERATURE; DIODES;
D O I
10.1016/j.mssp.2020.105471
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In the present work, ZnS/p-Si heterostructures have been prepared at different deposition durations using well known chemical bath deposition method. The structural, morphological and optical properties have been thoroughly investigated using x-ray diffraction, x-ray photoelectron spectroscopy, scanning electron microscopy, UV-visible and photoluminescence spectroscopy. The electrical studies of fabricated structures were carried out by studying the current-voltage (I-V) relation at 300 K. Using the I-V curve, important electrical parameters such as barrier height, saturation current and ideality factor have been calculated. The variation in electrical parameters of fabricated structures as a function of deposition time has been reported.
引用
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页数:8
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