Sputtering of Fe(100) due to low-energy ion bombardments: Molecular dynamics simulation

被引:3
作者
Kim, Dong-Ho
Kim, Do Hyun
机构
[1] Korean Inst Machinery & Mat, Surface Technol Res Ctr, Kyungnam 641010, South Korea
[2] Dept Chem & Biomol Engn, Taejon 305701, South Korea
关键词
molecular dynamic simulation; sputtering; iron; ion bombardment; YIELDS; FILMS; FE; SURFACE; METALS; ATOM; SPIN; CU;
D O I
10.1016/j.scriptamat.2006.08.006
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Molecular dynamics simulations were carried out to investigate the sputtering of Fe(l 0 0) due to low-energy (<= 10 keV)Ar ion bombardments. Bohr potentials fitted to the results of ab initio calculations for diatomic pairs (Ar-Fe, Fe-Fe) were used as the repulsive screened Coulombic potentials in sputtering simulations. The sputter yields predicted by molecular dynamics were in good accordance with the available experimental data. The threshold energy for sputtering, distributions of kinetic energies of sputtered atoms and their depth of origins could also be obtained. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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页码:1043 / 1046
页数:4
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