Modeling, Optimization and Simulation for Chemical Vapor Deposition

Our studies are motivated by a desire to model chemical vapor deposition for metallic bipolar plates and optimization to deposit a homogeneous layer We present a mesoscopic model, which reflects the transport and reaction of the gaseous species through a homogeneous media in the chamber The models, which are discussed in the article, considered the conservation of mass and the underlying porous media is in accordance with the Darcy's law. The transport through the stationary and non-ionized plasma field is treated as a diffusion-dominated flow, (Gobbert and Ringhofer SIAM J. Appl. Math., vol. 58, pp. 737-752, 1998) where the metallic deposit and the gas chamber, looking like a porous media, (Roach, Proc. of COMSOL Users Conference, Paris, 2006; Cao, Brinkman, Meijerink, DeVries, and Burggraaf J. Mater Chem., vol. 3, pp. 1307-1311, 1993). We choose porous ceramic membranes and gas catalysts like Argon (Ar), (Cao et al., 1993) and apply our experience in simulating gaseous flow and modeling the penetration of such porous media (Jin and Wang, J. Comput. Phys., vol. 79, pp. 557-577, 2002). Numerical methods are developed to solve such multi-scale models. We combine discretization methods with respect to the various source terms to control the required gas mixture and the homogeneous layering. We present an expert system with various source and target controls to present the accuratest computational models. For such efficient choice of models, we apply our numerical methods and simulate an optimal homogeneous deposition at the target. The results are discussed by means of physical experiments to give a valid model for the assumed growth.