Microstructural and corrosivity changes induced by nitrogen ion implantation on chromium films

被引：16
作者：
Shokouhy, A.
Larijani, M. M.
Ghoranneviss, M.
Hosseini-G, S. H. Haji
Yari, M.
Sari, A. H.
Shahraki, M. Gholipur
机构：
[1] Islamic Azad Univ, Plasma Phys Res Ctr, Tehran, Iran
[2] Atom Energy Org Iran, Nucl Res Ctr Agr & Med, Karj, Iran
[3] Univ Tehran, Dept Phys, Tehran, Iran
来源：
THIN SOLID FILMS | 2006年 / 515卷 / 02期
关键词：
nitrogen implantation; stainless steel; corrosion; CrN; thin film;
D O I：
10.1016/j.tsf.2005.12.171
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The chromium thin films were prepared using ion beam deposition on stainless steel 304. The chromium films were implanted by nitrogen ions after deposition at doses in the range of 4.5 x 10(17) to 2.7 x 10(18) N+/cm(2) and energy of 30 keV. The formation of nitride phases and corrosion behavior after nitrogen implantation were characterized by XRD and corrosion test, respectively. The results show that corrosion resistance rise, reach to a maximum at dose of 1.8 x 10(18), and then fall down at higher doses. In addition, the effect of corrosion tests was analyzed using scanning electron microscopy (SEM). (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：571 / 575
页数：5
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