Magnetoresistance of Fe-SiO2 granular films

被引:34
作者
Yang, W
Jiang, ZS
Wang, WN
Du, YW
机构
[1] NANJING UNIV, NATL LAB SOLID STATE MICROSTRUCT, NANJING 210093, PEOPLES R CHINA
[2] NANJING UNIV, CTR ADV SCI & TECHNOL MICROSTRUCT, NANJING 210093, PEOPLES R CHINA
[3] NANJING UNIV POSTS & TELECOMMUN, DEPT TELECOMMUN & ENGN, NANJING 210003, PEOPLES R CHINA
关键词
D O I
10.1016/S0038-1098(97)00369-4
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A new type of magnetoresistance (MR) was observed in Fe-SiO2 granular films. The samples were prepared on glass substrates using ion-beam sputtering technique. MR ratios of the order of 2.7% at room temperature and 4.5% at 210 K were obtained when a magnetic field of 1.2 T was applied parallel to the film plane. We have measured MR as a function of Fe volume fraction (f(V)) of the films. It was found that MR appears only in samples with f(V) less than the percolation threshold (f(C)) and has a peak value at f(V) approximate to 0.28. We also found that the enhancement of MR always appears together with the increase of resistance (R) of samples in the region 0.28 less than or equal to f(V) < 0.5. Our results indicate that MR in these materials arises from the spin-dependent tunneling effect and imply that the size of Fe particles and the thickness of SiO2 tunnel barriers may play an important role in the MR effect of Fe-SiO2 granular films. (C) 1997 Published by Elsevier Science Ltd.
引用
收藏
页码:479 / 484
页数:6
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