A comparison of three different notching ions for small-scale fracture toughness measurement

被引：37

作者：

Best, James P. ^{[1
]}

Zechner, Johannes ^{[1
]}

Shorubalko, Ivan ^{[2
]}

Obona, Jozef Vincenc ^{[3
]}

Wehrs, Juri ^{[1
]}

Morstein, Marcus ^{[4
]}

Michler, Johann ^{[1
]}

机构：

[1] Empa, Swiss Fed Labs Mat Sci & Technol, Lab Mech Mat & Nanostruct, CH-3602 Thun, Switzerland

[2] Empa, Swiss Fed Labs Mat Sci & Technol, Reliabil Sci & Technol, CH-8600 Dubendorf, Switzerland

[3] TESCAN Brno Sro, Brno 62300, Czech Republic

[4] PLATIT AG Adv Coating Syst, CH-2545 Selzach, Switzerland

来源：

SCRIPTA MATERIALIA | 2016年 / 112卷

关键词：

Physical vapor deposition (PVD); Ion-beam processing; Micromechanics; Toughness; Ceramic thin films; HARD COATINGS;

D O I：

10.1016/j.scriptamat.2015.09.014

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

While small-scale fracture toughness measurements provide an extremely useful material parameter, notch preparation and ion-beam damage continue to be contentious issues. Herein we utilize a conventional gallium source for notching ceramic cantilevers, and compare against notches fabricated using xenon and helium ions from commercial focused ion microscopes. This is the first time ions other than gallium have been used for notches in such measurements. We observe some statistical dependence of the measured toughness on the utilized notching ion, bringing into question the influence of ion-material interactions in creating residual stresses or embrittlement in the small volumes around the notch root. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：71 / 74

页数：4

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