The Spatial Distribution of Threading Dislocations in Gallium Nitride Films

被引:46
作者
Moram, Michelle A. [1 ]
Oliver, Rachel A. [1 ]
Kappers, Menno [1 ]
Humphreys, Colin J. [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
基金
英国工程与自然科学研究理事会;
关键词
EPITAXIAL LATERAL OVERGROWTH; VAPOR-PHASE EPITAXY; THIN-FILMS; GAN; EFFICIENCY; REDUCTION; SAPPHIRE; GROWTH; POINT;
D O I
10.1002/adma.200901095
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Spatial analysis techniques are used to study threading dislocations (TDs) at the surfaces of a wide range of GaN films. In all films, the dislocation positions are consistent with a spatially random TD generation process followed by movement of dislocations, but are inconsistent with the spatial distribution of dislocations expected at island coalescence boundaries.
引用
收藏
页码:3941 / +
页数:5
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