X-ray induced decomposition of gold nitride

被引:33
作者
Butenko, Yu. V.
Alves, L.
Brieva, A. C.
Yang, J.
Krishnamurthy, S.
Siller, L. [1 ]
机构
[1] Univ Newcastle Upon Tyne, Sch Chem Engn & Adv Mat, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
[2] Univ Newcastle Upon Tyne, Inst Nanoscale Sci & Technol, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1016/j.cplett.2006.08.096
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Gold films containing gold nitride have been produced by nitrogen reactive ion sputtering and characterized by X-ray photoemission spectroscopy. N1s core-level spectra from the films show a peak at 397.0 +/- 0.2 eV attributed to gold nitride species. The intensity of the nitride peak decays with measurement time, demonstrating that this material decomposes under X-ray irradiation. Atomic force microscopy shows that the nitride containing films are also sensitive to electron beam irradiation, indicating that X-ray or electron beam lithography may be used to directly write patterns on a gold nitride surface. (c) 2006 Published by Elsevier B.V.
引用
收藏
页码:89 / 92
页数:4
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