The oxidation of (100) textured diamond

被引：72
作者：
John, P [1 ]
Polwart, N
Troupe, CE
Wilson, JIB
机构：
[1] Heriot Watt Univ, Dept Chem, Edinburgh EH14 4AS, Midlothian, Scotland
[2] Heriot Watt Univ, Dept Phys, Edinburgh EH14 4AS, Midlothian, Scotland
来源：
DIAMOND AND RELATED MATERIALS | 2002年 / 11卷 / 3-6期
基金：
英国工程与自然科学研究理事会;
关键词：
thermal-oxidation; surface; photoelectron spectroscopy; etching;
D O I：
10.1016/S0925-9635(01)00673-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The thermal oxidation of highly textured (100) chemical vapour deposited (CVD) diamond has been investigated using a combination of high resolution X-ray photoelectron spectroscopy. The diamond samples were oxidised in dry O-2 in a vacuum furnace at temperatures up to 800 degreesC. The kinetics of oxidation of well-defined crystal facets of (100) diamond have been studied using in-situ laser interferometry and thermogravimetric analysis. Concomitant scanning probe microscopic examination of individual facets after oxidation revealed negligible changes to the surface roughness. Oxygen containing functional groups such as ether (COC) and carbonyl (>C=O) have been observed using X-ray photoelectron spectroscopy at all the surface coverages investigated. Even at higher coverages the formation of higher oxidation states such as carboxylic acid groupings was negligible (<2.5%). Angle resolved X-ray photoelectron spectroscopy measurements have been used to discriminate between surface and sub-surface oxygen. (C) 2002 Elsevier Science B.V. All rights reserved.
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收藏
页码：861 / 866
页数：6
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