Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating

被引：7

作者：

Awad, Y ^{[1
]}

Lavallée, E ^{[1
]}

Lau, KM ^{[1
]}

Beauvais, J ^{[1
]}

Drouin, D ^{[1
]}

Cloutier, M ^{[1
]}

Turcotte, D ^{[1
]}

Yang, P ^{[1
]}

Kelkar, P ^{[1
]}

机构：

[1] Quantiscript Inc, Sherbrooke, PQ J1K 2R1, Canada

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2004年 / 22卷 / 03期

关键词：

D O I：

10.1116/1.1647589

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask formed by nickel pulse reversal plating to invert the tonality of a dry e-beam resist patterned by e-beam lithography. Ni plating was carried out using a commercial plating solution based on nickel sulfamate salt without organic additives. Reactive ion etching using SF6 /CH4 was found to be very effective for pattern transfer to silicon nitride. Holes array of 100 nm diam, 270 nm period, and 400 nm depth was fabricated on a 5 x 5 mm(2) area. (C) 2004 American Vacuum Society.

引用

收藏

页码：1040 / 1043

页数：4

相关论文

共 21 条

[1] Low temperature nanoimprint lithography using silicon nitride molds [J].

Alkaisi, MM ;

Blaikie, RJ ;

McNab, SJ .

MICROELECTRONIC ENGINEERING, 2001, 57-8 :367-373

[2] Fabrication of x-ray masks using evaporated electron sensitive layers for back patterning of membranes [J].

Awad, Y ;

Lavallee, E ;

Beauvais, J ;

Drouin, D ;

Yang, P ;

Turcotte, D ;

Mun, LK .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :3040-3043

[3] Three-dimensional electron-beam lithography using an all-dry resist process [J].

Babin, S ;

Koops, HWP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :3860-3863

[4] Fabrication of a refractive microlens integrated onto the monomode fiber [J].

Babin, S ;

Weber, M ;

Koops, HWP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4076-4079

[5] Nanoimprinting over topography and multilayer three-dimensional printing [J].

Bao, LR ;

Cheng, X ;

Huang, XD ;

Guo, LJ ;

Pang, SW ;

Yee, AF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :2881-2886

[6] Image quality and seeing measurements for long horizontal overwater propagation [J].

Beaumont, H ;

Aime, C ;

Aristidi, E ;

Lanteri, H .

PURE AND APPLIED OPTICS, 1997, 6 (01) :15-30

[7] Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications [J].

Chen, XL ;

Zaidi, SH ;

Brueck, SRJ ;

Devine, DJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (05) :3339-3349

[8] Extraordinary optical transmission through sub-wavelength hole arrays [J].

Ebbesen, TW ;

Lezec, HJ ;

Ghaemi, HF ;

Thio, T ;

Wolff, PA .

NATURE, 1998, 391 (6668) :667-669

[9] Methods for fabricating arrays of holes using interference lithography [J].

Fernandez, A ;

Decker, JY ;

Herman, SM ;

Phillion, DW ;

Sweeney, DW ;

Perry, MD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2439-2443

[10] Progress toward the fabrication of scanning near field optical probe: pattern definition by e-beam lithography [J].

Foglietti, V ;

Cianci, E ;

Giannini, G .

MICROELECTRONIC ENGINEERING, 2001, 57-8 :807-811