HRTEM Analysis of AlN Layer Grown on 3C-SiC/Si Heteroepitaxial Substrates with Various Surface Orientations

被引:2
作者
Isshiki, Toshiyuki [1 ]
Nishio, Koji [1 ]
Abe, Yoshihisa [2 ]
Komiyama, Jun [2 ]
Suzuki, Shunichi [2 ]
Nakanishi, Hideo [2 ]
机构
[1] Kyoto Inst Technol, Sakyo Ku, Kyoto 6068585, Japan
[2] Covalent Mat Corp, Hadano, Kanagawa 2578566, Japan
来源
SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2 | 2009年 / 600-603卷
关键词
AlN; SiC buffer layer; Interface structure; High-resolution TEM investigation; CHEMICAL-VAPOR-DEPOSITION;
D O I
10.4028/www.scientific.net/MSF.600-603.1317
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Epitaxial growth of AlN was carried out by MOVPE method on SiC/Si buffered substrates prepared by using various Si surfaces of (110), (211) and (001). Cross-sectional HRTEM analyses of the interfaces between SiC buffer layer and AlN epitaxial layer disclosed characteristic nanostructures related growth mechanism on the each substrate. In the case of Si(110) and Si(211) substrate, hexagonal AlN grew directly on SiC(111) plane with AlN(0001) plane parallel to it. In contrast, growth on Si(001) substrate gave complicate structure at AlN/SiC interface. Hexagonal AlN didn't grow directly but cubic AlN appeared with a pyramidal shape on SiC(001). When the cubic AlN grew 10nm in height, structure of growing AlN crystal changed to hexagonal type on the pyramidal {111} planes of cubic AlN.
引用
收藏
页码:1317 / +
页数:2
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