Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique

被引：0

作者：

Jelínek, M

Kulisch, W

Lancok, J

Popov, C

Bulír, J

Delplancke-Ogletree, MP

机构：

[1] Acad Sci Czech Republ, Inst Phys, Prague 18221 8, Czech Republic

[2] Univ Kassel, D-34109 Kassel, Germany

[3] Free Univ Brussels, Brussels, Belgium

来源：

MOLECULAR CRYSTALS AND LIQUID CRYSTALS | 2002年 / 374卷

关键词：

laser deposition; carbon nitride; radiofrequency discharge; hollow cathode discharge;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Highly nitrogenated CNx films were created by pulsed laser deposition (PLD), combined with radiofrequency (RF) and hollow cathode (HC) discharges. The N/C ratio higher than 1 was measured. Deposition setup and results of optical measurement are discussed.

引用

页码：281 / 284

页数：4

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