Bulk AlN growth by physical vapour transport

被引:112
|
作者
Hartmann, C. [1 ]
Dittmar, A. [1 ]
Wollweber, J. [1 ]
Bickermann, M. [1 ]
机构
[1] Leibniz Inst Crystal Growth IKZ, Max Born Str 2, D-12489 Berlin, Germany
关键词
AlN crystal growth; Nitride semiconductors; Vapour growth; Bulk crystals; ALUMINUM NITRIDE CRYSTALS; SI-DOPED ALN; SUBLIMATION GROWTH; SINGLE-CRYSTALS; SEEDED GROWTH; OPTICAL-PROPERTIES; AMMONOTHERMAL SYNTHESIS; THEORETICAL-ANALYSIS; THICK ALN; GAN;
D O I
10.1088/0268-1242/29/8/084002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The process technologies of AlN growth by physical vapour transport are reviewed in this paper with a focus on the growth parameters, crucible materials, and the type of seeding/nucleation. In this context the three growth strategies for the first generation of AlN seeds, (i) grain selection, (ii) heteroepitaxially seeding on SiC, and (iii) spontaneous nucleation, are evaluated regarding their impact on the structural properties and the sizes of the grown AlN crystals. Major issues for subsequent homoepitaxial growth runs with controlled diameter enlargement, such as thermal field design and seed fixation, are addressed. Furthermore, the influences of the growth conditions on the main optical absorption bands in AlN are discussed.
引用
收藏
页数:10
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