Hydrogenated diamond-like carbon;
Cobalt implantation;
Room temperature;
Hydrogen redistribution;
Bimodal metal ion distribution;
Collision cascades;
ION;
TEMPERATURE;
SIMULATION;
COATINGS;
D O I:
10.1016/j.nimb.2016.12.029
中图分类号:
TH7 [仪器、仪表];
学科分类号:
0804 ;
080401 ;
081102 ;
摘要:
Hydrogenated diamond-like carbon films produced by C3H6 deposition at 5 kV and implanted at room temperature with 30 keV Co atoms to 12 at.% show not only a bimodal distribution of Co atoms but also a massive redistribution of hydrogen in the films. Resonant nuclear reaction analysis was used to measure the hydrogen depth profiles (15N-method). Depletion of hydrogen near the surface was measured to be as low as 7 at.% followed by hydrogen accumulation from 27 to 35 at.%. A model is proposed considering the thermal energy deposited by collision cascade for thermal insulators. In this model, sufficient energy is provided for dissociated hydrogen to diffuse out of the sample from the surface and diffuse into the sample towards the interface which is however limited by the range of the incoming Co ions. At a hydrogen concentration of 35 at.%, the concentration gradient of the mobile unbounded hydrogen atoms is neutralised effectively stopping diffusion towards the interface. The results point towards new routes of controlling the composition and distribution of elements at the nanoscale within a base matrix without using any heat treatment methods. Exploring these opportunities can lead to a new horizon of materials and device engineering needed for enabling advanced technologies and applications. (C) 2016 Elsevier B.V. All rights reserved.
机构:
GNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Univ Auckland, Dept Chem, Auckland, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Leveneur, J.
;
Kennedy, J.
论文数: 0引用数: 0
h-index: 0
机构:
GNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Kennedy, J.
;
Williams, G. V. M.
论文数: 0引用数: 0
h-index: 0
机构:
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New Zealand
Ind Res Ltd, Lower Hutt, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Williams, G. V. M.
;
Metson, J.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Auckland, Dept Chem, Auckland, New Zealand
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Metson, J.
;
Markwitz, A.
论文数: 0引用数: 0
h-index: 0
机构:
GNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
机构:
GNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Univ Auckland, Dept Chem, Auckland, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Leveneur, J.
;
Kennedy, J.
论文数: 0引用数: 0
h-index: 0
机构:
GNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Kennedy, J.
;
Williams, G. V. M.
论文数: 0引用数: 0
h-index: 0
机构:
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New Zealand
Ind Res Ltd, Lower Hutt, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Williams, G. V. M.
;
Metson, J.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Auckland, Dept Chem, Auckland, New Zealand
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
Metson, J.
;
Markwitz, A.
论文数: 0引用数: 0
h-index: 0
机构:
GNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand
MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New ZealandGNS Sci, Natl Isotope Ctr, Lower Hutt, New Zealand