Multilayer dielectric gratings for Petawatt-class laser systems

被引：46

作者：

Britten, JA ^{[1
]}

Molander, W ^{[1
]}

Komashko, AM ^{[1
]}

Barty, CPJ ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2003 | 2003年 / 5273卷

关键词：

multilayer dielectric gratings; Petawatt lasers; chirped pulse amplification; reactive ion milling; atomic force microscopy;

D O I：

10.1117/12.524015

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Existing Petawatt class lasers today based on Nd:glass architectures operating at nominally 500 J, 0.5 ps use meter-scale aperture, gold-overcoated master photoresist gratings to compress the amplified chirped pulse. Many lasers operating in the >1kJ, >1ps regime are in the planning stages around the world. These will require multilayer dielectric diffraction gratings to handle larger pulse energy than can be accommodated with gold gratings. Models of the electric field distribution in the solid material of these gratings suggest that high aspect-ratio structures used at high incidence angles will have better laser damage resistance. New tooling for transfer etching these submicron-grating patterns and for nondestructive critical-dimension measurement of these features on meter-scale substrates will be described.

引用

页码：1 / 7

页数：7

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