Growth of Fe/Ge(001) heterostructures by molecular beam epitaxy: Interface structure, electronic and magnetic properties

被引:10
作者
Tari, S [1 ]
Sporken, R
Aoki, T
Smith, DJ
Metlushko, V
AbuEl-Rub, K
Sivananthan, S
机构
[1] Univ Illinois, Microphys Lab, Chicago, IL 60607 USA
[2] Fac Univ Notre Dame Paix, Lab Phys Mat Elect, B-5000 Namur, Belgium
[3] Arizona State Univ, Ctr Solid State Sci, Tempe, AZ 85287 USA
[4] Univ Illinois, Dept Elect & Comp Engn, Chicago, IL 60607 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 04期
关键词
D O I
10.1116/1.1491992
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin Fe films have been grown on Ge(001) substrates using molecular beam epitaxy, and the interface structure, electronic and magnetic properties have been studied. Cross-sectional transmission electron microscopy indicated that the substrates are uniformly covered by the Fe films, and x-ray photoemission spectroscopy did not show any evidence for reaction or intermixing at the interface. The growth did not appear to be affected by deposition of an As monolayer prior to Fe growth. Saturation magnetization measured for a 3.7 nm thick Fe layer on Ge(001) was close to the value for bulk Fe. The angular dependence of magnetization shows fourfold symmetry, typical of bcc Fe. (C) 2002 American Vacuum Society.
引用
收藏
页码:1586 / 1590
页数:5
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