A Possibility of Crystalline Indium-Gallium-Zinc-Oxide to Very Large Scale Integration

被引:7
|
作者
Yamazaki, Shunpei [1 ]
机构
[1] Semicond Energy Lab Co LTD, Atsugi, Kanagawa, Japan
来源
2013 INTERNATIONAL CONFERENCE ON SEMICONDUCTOR TECHNOLOGY FOR ULTRA LARGE SCALE INTEGRATED CIRCUITS AND THIN FILM TRANSISTORS (ULSIC VS. TFT 4) | 2013年 / 54卷 / 01期
关键词
D O I
10.1149/05401.0085ecst
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We have found that an IGZO film can exhibit a c-axis orientation by extremely highly purifying the oxide semiconductor. We call this IGZO as CAAC (C-Axis Aligned Crystal). CAAC structure can be achieved even on an amorphous and concave-convex surface. The CAAC structure has a crystal morphology in which a crystal grain boundary is not observed. By virtue of the CAAC structure, an off current Ioff is on the order of yA/mu m (10(-24) A/mu m) even with a channel length of 0.45 mu m at a temperature of 85 degrees C. This can be used for an ideal four-terminal switching element of a voltage input type having an on/off ratio of 20 digits or greater. Also, the temperature characteristics of Vg-Id are stable at temperatures ranging from. -25 degrees C to 150 degrees C. We attempted to apply it to a normally-off CPU and FPGA with a small increase of F2 and a non-volatile memory without degradation.
引用
收藏
页码:85 / 96
页数:12
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