Light-patterned and recognition-directed adsorption of nanoparticles at a silicon wafer substrate

被引：17

作者：

Ryan, D ^{[1
]}

Nagle, L ^{[1
]}

Fitzmaurice, D ^{[1
]}

机构：

[1] Natl Univ Ireland Univ Coll Dublin, Dept Chem, Dublin 4, Ireland

来源：

NANO LETTERS | 2004年 / 4卷 / 04期

关键词：

D O I：

10.1021/nl0351340

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A silicon wafer was modified by chemisorption of a monolayer of a cation precursor and exposed to blue light through a mask. In the regions exposed to blue light, the cation precursor was converted to cation. These cations were recognized and bound selectively by nanoparticles modified by adsorption of crown. As a consequence, these crown-modified nanoparticles were adsorbed at only the desired regions and pattern transfer was affected.

引用

页码：573 / 575

页数：3

共 24 条

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