Nanofabrication techniques

被引：28

作者：

Mailly, D. ^{[1
]}

机构：

[1] Alcatel Alsthom Rech, Route Nozay, CNRS, LPN, F-91460 Marcoussis, France

来源：

EUROPEAN PHYSICAL JOURNAL-SPECIAL TOPICS | 2009年 / 172卷

关键词：

PMMA; PDMS; European Physical Journal Special Topic; Scan Tunnelling Microscope; Electron Beam Lithography;

D O I：

10.1140/epjst/e2009-01058-x

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The main techniques to produce objects of size smaller than 100 nm are reviewed in this paper. For each process, the principle of the technique, the operating procedure and the resolution are presented. The review is restricted to the so called down-techniques. The bottom-up techniques using self organization, selective epitaxy and other chemistry like processes are not covered.

引用

页码：333 / 342

页数：10

共 11 条

[1]

Born M., PRINCIPLES OPTICS

[2]

BROERS AN, 1988, IBM RES J, V32, P4

[3] FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES [J].

CHEN, W ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2519-2523

[4]

Chou S.Y., 1997, J VAC SCI TECHNOL B, V15, P6

[5]

CROMMIE MF, 2000, NATURE, V403, P512

[6] Exploration of the ultimate patterning potential achievable with focused ion beams [J].

Gierak, J ;

Bourhis, E ;

Combes, MNM ;

Chriqui, Y ;

Sagnes, I ;

Mailly, D ;

Hawkes, P ;

Jede, R ;

Bruchhaus, L ;

Bardotti, L ;

Prével, B ;

Hannour, A ;

Mélinon, P ;

Perez, A ;

Ferré, J ;

Jamet, JP ;

Mougin, A ;

Chappert, C ;

Mathet, V .

MICROELECTRONIC ENGINEERING, 2005, 78-79 :266-278

[7]

GROSE D, 2007, TECHNOLOGY ANAL 0726

[8] Nano-oxidation of semiconductor heterostructures with atomic force microscopes:: technology and applications [J].

Heinzel, T ;

Lüscher, S ;

Fuhrer, A ;

Salis, G ;

Held, R ;

Ensslin, K ;

Wegscheider, W ;

Bichler, M .

OPTICAL DEVICES AND DIAGNOSTICS IN MATERIALS SCIENCE, 2000, 4098 :52-64

[9]

Jackson J.D., CLASSICAL ELECTRODYN, V3rd

[10] Magnetic interactions in dot arrays with perpendicular anisotropy [J].

Repain, V ;

Jamet, JP ;

Vernier, N ;

Bauer, M ;

Ferré, J ;

Chappert, C ;

Gierak, J ;

Mailly, D .

JOURNAL OF APPLIED PHYSICS, 2004, 95 (05) :2614-2618

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