Effect of gas-mixing and substrate temperatures on structural properties of GaN nanorods grown on Si (111) substrates by using hydride vapor-phase epitaxy

被引:3
作者
Lee, K. H. [2 ]
Lee, J. Y. [2 ]
Kwon, Y. H. [3 ]
Ryu, S. Y. [3 ]
Kang, T. W. [3 ]
Yoo, C. H. [1 ]
Lee, D. U. [1 ]
Kim, T. W. [1 ]
机构
[1] Hanyang Univ, Adv Semicond Res Ctr, Div Elect & Comp Engn, Seoul 133791, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[3] Dongguk Univ, Quantum Funct Semicond Res Ctr, Seoul 100715, South Korea
关键词
Nanostructures; Hydride vapor phase epitaxy; Nanomaterials; Semiconducting III-V materials; LIGHT-EMITTING-DIODES; OPTICAL-PROPERTIES; NANOWIRES; PHOTOLUMINESCENCE; DEPOSITION;
D O I
10.1016/j.jcrysgro.2008.11.031
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
X-ray diffraction patterns, scanning electron microscopy images, and transmission electron microscopy (TEM) images showed that one-dimensional GaN nanorods grown on Si (111) substarates by using hydride vapor phase epitaxy had crystalline wurzite structures and were preferentially oriented along the [0 0 0 1] direction. The high-resolution TEM (HRTEM) images showed that the side facet planes of the tip region for the GaN nanorods consisted of {(1) over bar1 0 0}, {(1) over bar1 0 2}, and {(1) over bar 1 0 3} planes. The structural properties of the GaN nanorods were significantly affected by the gas-mixing and the substrate temperatures in the final growth zone. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:244 / 248
页数:5
相关论文
共 36 条
[21]   High-quality InGaN MQW on low-dislocation-density GaN substrate grown by hydride vapor-phase epitaxy [J].
Sasaoka, C ;
Sunakawa, H ;
Kimura, A ;
Nido, M ;
Usui, A ;
Sakai, A .
JOURNAL OF CRYSTAL GROWTH, 1998, 189 :61-66
[22]   HOMOEPITAXIAL GROWTH OF CUBIC GAN BY HYDRIDE VAPOR-PHASE EPITAXY ON CUBIC GAN/GAAS SUBSTRATES PREPARED WITH GAS-SOURCE MOLECULAR-BEAM EPITAXY [J].
TSUCHIYA, H ;
OKAHISA, T ;
HASEGAWA, F ;
OKUMURA, H ;
YOSHIDA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1994, 33 (4A) :1747-1752
[23]   Fe-doped semi-insulating GaN substrates prepared by hydride vapor-phase epitaxy using GaAs starting substrates [J].
Kumagai, Yoshinao ;
Satoh, Fumitaka ;
Togashi, Rie ;
Murakami, Hisashi ;
Takemoto, Kikurou ;
Iihara, Junji ;
Yamaguchi, Koji ;
Koukitu, Akinori .
JOURNAL OF CRYSTAL GROWTH, 2006, 296 (01) :11-14
[24]   Electrical Properties of Halogen-Doped CdTe Layers on Si Substrates Grown by Metalorganic Vapor-Phase Epitaxy [J].
Yasuda, K. ;
Niraula, M. ;
Oka, H. ;
Yoneyama, T. ;
Matsumoto, K. ;
Nakashima, H. ;
Nakanishi, T. ;
Katoh, D. ;
Agata, Y. .
JOURNAL OF ELECTRONIC MATERIALS, 2010, 39 (07) :1118-1123
[25]   A Novel Growth Method of Freestanding GaN Using In situ Removal of Si Substrate in Hydride Vapor Phase Epitaxy [J].
Lee, Moonsang ;
Mikulik, Dmitry ;
Kim, Joosung ;
Tak, Youngjo ;
Kim, Junyoun ;
Shim, Munbo ;
Park, Youngsoo ;
Chung, Uin ;
Yoon, Euijoon ;
Park, Sungsoo .
APPLIED PHYSICS EXPRESS, 2013, 6 (12)
[26]   Electrical properties in free-standing GaN substrates fabricated by hydride vapor-phase epitaxy and self-separation technique [J].
Oh, Dong-Cheol ;
Lee, Hyun-Jae ;
Ko, Hang-Ju ;
Jhun, Chul-Gyu .
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2014, 65 (10) :1696-1700
[27]   Effect of Refined Nitridation of Sapphire Substrates in Hydride Vapor Phase Epitaxy: Definite Correlation of Structural Characteristics between a Low-Temperature-Grown Buffer Layer and a Subsequent High-Temperature-Grown Layer of GaN [J].
Lee, Hyun-Jae ;
Ha, Jun-Seok ;
Lee, Hyo-Jong ;
Lee, Seogwoo ;
Cho, Meoungwhan ;
Yao, T. ;
Kim, Chinkyo ;
Hong, Soon-Ku ;
Chang, Jiho .
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 54 (06) :2404-2408
[28]   Effects of the group V/III ratio and a gan inter-layer on the crystal quality of InN grown by using the hydride vapor-phase epitaxy method [J].
Ha, Ju-Hyung ;
Wang, Juan ;
Lee, Won-Jae ;
Choi, Young-Jun ;
Lee, Hae-Yong ;
Kim, Jung-Gon ;
Harima, Hiroshi .
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2015, 66 (06) :994-1000
[29]   Effects of the group V/III ratio and a gan inter-layer on the crystal quality of InN grown by using the hydride vapor-phase epitaxy method [J].
Ju-Hyung Ha ;
Juan Wang ;
Won-Jae Lee ;
Young-Jun Choi ;
Hae-Yong Lee ;
Jung-Gon Kim ;
Hiroshi Harima .
Journal of the Korean Physical Society, 2015, 66 :994-1000
[30]   Structural and Stress Properties of A1GaN Epilayers Grown on A1N-Nanopatterned Sapphire Templates by Hydride Vapor Phase Epitaxy [J].
Tasi, Chi-Tsung ;
Wang, Wei-Kai ;
Ou, Sin-Liang ;
Huang, Shih-Yung ;
Horng, Ray-Hua ;
Wuu, Dong-Sing .
NANOMATERIALS, 2018, 8 (09)