Production of large-diameter plasma using multi-slotted planar antenna

被引：19
|
作者：
Yasaka, Y [1 ]
Nozaki, D
Koga, K
Ando, M
Yamamoto, T
Goto, N
Ishii, N
Morimoto, T
机构：
[1] Kyoto Univ, Dept Elect Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
[2] Tokyo Inst Technol, Dept Elect & Elect Engn, Tokyo 1528552, Japan
[3] Takushoku Univ, Dept Elect & Syst, Hachioji, Tokyo 1938511, Japan
[4] Tokyo Electron Ltd, Corp Res & Dev, Cent Res Lab, Yamanashi 4070192, Japan
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 1999年 / 8卷 / 04期
关键词：
D O I：
10.1088/0963-0252/8/4/302
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
It is reported that a large-diameter uniform plasma is obtained by microwave discharges using multi-slotted planar (MSP) antenna. The MSP antenna radiates the microwave field from a large number of slots so as to form a uniform radial distribution of the field in the outer radii. Overdense plasmas are produced with +/-3-4% uniformity of the ion saturation current over a 30 cm diameter for Ar pressures of 5-10 mTorr and microwave powers of 1-3 kW. The efficient production of overdense plasmas may be due to the enhancement of the microwave field of oblique incidence at the plasma resonance.
引用
收藏
页码：530 / 533
页数：4
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