Ultraviolet light induced changes in polyimide liquid-crystal alignment films

被引:74
作者
Lu, J
Deshpande, SV
Gulari, E
Kanicki, J
Warren, WL
机构
[1] UNIV MICHIGAN, CTR DISPALY TECHNOL & MFG, ANN ARBOR, MI 48109 USA
[2] SANDIA NATL LABS, ADV MAT LAB, ALBUQUERQUE, NM 87185 USA
关键词
D O I
10.1063/1.363467
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ultraviolet light induced changes in polyimide liquid-crystal alignment films were investigated. Infrared, UV-visible, x-ray photoelectron spectroscopy, and electron-spin-resonance measurements indicated that bond breaking and subsequent oxidation reactions occur in polyimide films (SE7210, OCG284, DuPont 2555 and 2540) during the broadband UV illumination in air. Mechanical rubbing has no effect on the optical and magnetic properties but it causes the removal of the UV-exposed film. Capacitance-voltage measurements indicate that there is a slight decrease in dielectric constant and creation of net negative charges in the film after UV exposure. Surface tension of polyimide films before and after UV illumination and changes in the pretilt angle of the polyimide surface following UV exposure have also been studied. The decrease in pretilt angle following UV illumination is attributed to an increase in surface tension. Our results indicate that a simple UV technique can be used to achieve domain divided liquid-crystal pixel electrode design with improved viewing characteristics. (C) 1996 American Institute of Physics.
引用
收藏
页码:5028 / 5034
页数:7
相关论文
共 29 条
[1]  
ABE T, 1991, ORG SYNTH CHEM, V49, P145
[2]  
CAMPBELL D, 1989, POLYM CHARACTERIZATI, pCH4
[3]  
COBURN JC, 1993, MATER RES SOC SYMP P, V308, P475, DOI 10.1557/PROC-308-475
[4]  
COGNARD J, 1982, MOL CRYST LIQ CRYST, P1
[5]  
DOLE M, 1972, AD CHEM MACR, V1, P282
[6]  
DYADUYSHA A, 1995, P SOC PHOTO-OPT INS, V2408, P151, DOI 10.1117/12.207509
[7]  
GHIGGINO KP, 1989, ACS SYM SER, V381, P27
[8]  
GRABMAIER JG, 1975, APPL LIQUID CRYSTALS, P100
[9]   DETERMINATION OF MOLECULAR INCLINATION IN RUBBED POLYMER FOR LIQUID-CRYSTAL ALIGNMENT BY MEASURING RETARDATION [J].
HAN, KY ;
VETTER, P ;
UCHIDA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (9A) :L1242-L1244
[10]  
HASEGAWA M, 1995, IDRC 94, P213