Thermal stability of the solid DNA as a novel optical material

被引：13

作者：

Niziol, Jacek ^{[1
]}

Makyla-Juzak, Katarzyna ^{[2
]}

Marzec, Mateusz M. ^{[3
]}

Ekiert, Robert ^{[4
]}

Marzec, Monika ^{[5
]}

Gondek, Ewa ^{[6
]}

机构：

[1] AGH Univ Sci & Technol, Fac Phys & Appl Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland

[2] Jagiellonian Univ, Fac Chem, Ul Ingardena 3, PL-30060 Krakow, Poland

[3] AGH Univ Sci & Technol, Acad Ctr Mat & Nanotechnol, Al Mickiewicza 30, PL-30059 Krakow, Poland

[4] Jagiellonian Univ, Fac Biochem Biophys & Biotechnol, Dept Mol Biophys, Ul Gronostajowa 7, PL-30387 Krakow, Poland

[5] Jagiellonian Univ, Inst Phys, Ul Lojasiewicza 11, PL-30348 Krakow, Poland

[6] Cracow Univ Technol, Inst Phys, Ul Podchorazych 1, PL-30054 Krakow, Poland

来源：

OPTICAL MATERIALS | 2017年 / 66卷

关键词：

Solid deoxyribonucleic acid; Ellipsometry; Optical materials; Nonlinear optics; DNA ageing; Organic electronics; NMR; CONDUCTIVITY; REHYDRATION; LAYERS; WATER; FILM; CTMA;

D O I：

10.1016/j.optmat.2017.02.035

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Deoxyribonucleic acid (DNA) has been extensively exploited for the past decade as the matrix material in organic electronics and nonlinear optics. In this work thermal stability of DNA in solid form was thoroughly studied, mainly by optical methods. Solid samples of low molecular mass DNA were subjected to heating according to different protocols and dissolved. The temperature effect was observed in the evolution of UV absorption and circular dichroism spectra. Thin films of DNA were deposited on polished silicon wafers. They were conditioned at consecutively raised temperature and simultaneously measured by spectroscopic ellipsometry. Changes in chemical composition of thermally treated films were studied by XPS. Below 100 degrees C all thermal effects were reversible. Melting occurred at c.a.140 degrees C. Irreversible chemical changes probably occurred at 170-180 degrees C. (C) 2017 Elsevier B.V. All rights reserved.

引用

页码：344 / 350

页数：7

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